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US08821957B2 Method for depositing a nanometric thin film on a substrate 有权
在衬底上沉积纳米薄膜的方法

Method for depositing a nanometric thin film on a substrate
Abstract:
The invention concerns in particular a method for depositing a nanometric multilayer thin film on a substrate from a liquid solution containing at least one surfactant. The method includes the following steps: forming a film from the solution; contacting the substrate; and depositing the film on the substrate. The invention is particularly formed to enable depositing black films on different types of surfaces, in particular for obtaining highly organized films. The films obtained by the method are particularly useful in electronics and optics.
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