Invention Grant
- Patent Title: Method for depositing a nanometric thin film on a substrate
- Patent Title (中): 在衬底上沉积纳米薄膜的方法
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Application No.: US12299798Application Date: 2007-05-11
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Publication No.: US08821957B2Publication Date: 2014-09-02
- Inventor: Jean-Jacques Benattar
- Applicant: Jean-Jacques Benattar
- Applicant Address: FR Paris
- Assignee: Commissariat a l'Energie Atomique
- Current Assignee: Commissariat a l'Energie Atomique
- Current Assignee Address: FR Paris
- Agency: Young & Thompson
- Priority: FR0604297 20060515
- International Application: PCT/FR2007/000810 WO 20070511
- International Announcement: WO2007/132089 WO 20071122
- Main IPC: B05D3/00
- IPC: B05D3/00 ; B05D1/20 ; B82Y30/00 ; B82Y40/00 ; B05D1/00 ; B05D3/04

Abstract:
The invention concerns in particular a method for depositing a nanometric multilayer thin film on a substrate from a liquid solution containing at least one surfactant. The method includes the following steps: forming a film from the solution; contacting the substrate; and depositing the film on the substrate. The invention is particularly formed to enable depositing black films on different types of surfaces, in particular for obtaining highly organized films. The films obtained by the method are particularly useful in electronics and optics.
Public/Granted literature
- US20090197064A1 METHOD FOR DEPOSITING A NANOMETRIC THIN FILM ON A SUBSTRATE Public/Granted day:2009-08-06
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