Invention Grant
- Patent Title: Apparatus and method for smoothly coating substrates
- Patent Title (中): 用于平滑地涂覆基材的装置和方法
-
Application No.: US12279394Application Date: 2007-02-13
-
Publication No.: US08863684B2Publication Date: 2014-10-21
- Inventor: Wolfgang Stangl , Hans-Jürgen Stangl
- Applicant: Wolfgang Stangl , Hans-Jürgen Stangl
- Applicant Address: DE Eichenau DE Schwaebisch Hall
- Assignee: Stangl Semiconductor Equipment AG,Würth Solar GmbH & Co. KG
- Current Assignee: Stangl Semiconductor Equipment AG,Würth Solar GmbH & Co. KG
- Current Assignee Address: DE Eichenau DE Schwaebisch Hall
- Agency: Keating & Bennett, LLP
- Priority: DE102006007446 20060217
- International Application: PCT/EP2007/001246 WO 20070213
- International Announcement: WO2007/093390 WO 20070823
- Main IPC: B05C13/00
- IPC: B05C13/00 ; B05C5/00 ; B05D1/02 ; B05C15/00 ; B05C11/08 ; B05C9/06 ; B05B15/12 ; H01L21/67

Abstract:
The surface of a substrate may be smoothly covered with a liquid when the substrate is fixed in a holder which together with forms, together with the surface of the substrate, a process volume into which the liquid may be introduced onto the surface of the substrate by means of a wetter, and when the holder including the substrate is set in a swaying motion by means of a swayer, so that the liquid will smoothly spread on the surface of the substrate. By the swaying motion, concentration of the volume of liquid at a specific location of the substrate surface is prevented, since the direction of motion of the liquid changes constantly.
Public/Granted literature
- US20090311431A1 APPARATUS AND METHOD FOR SMOOTHLY COATING SUBSTRATES Public/Granted day:2009-12-17
Information query