Invention Grant
- Patent Title: Charged particle beam applied apparatus, and irradiation method
- Patent Title (中): 带电粒子束施加装置和照射方法
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Application No.: US13993822Application Date: 2011-12-02
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Publication No.: US08907278B2Publication Date: 2014-12-09
- Inventor: Momoyo Enyama , Hiroya Ota , Taku Ninomiya , Mari Nozoe
- Applicant: Momoyo Enyama , Hiroya Ota , Taku Ninomiya , Mari Nozoe
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Mattingly & Malur, PC
- Priority: JP2010-279166 20101215
- International Application: PCT/JP2011/077900 WO 20111202
- International Announcement: WO2012/081422 WO 20120621
- Main IPC: G01N23/00
- IPC: G01N23/00 ; G21K7/00 ; H01J37/147 ; H01J37/12 ; H01J37/28 ; H01J37/04

Abstract:
Provided is a charged particle beam applied apparatus for observing a sample, provided with: a beam-forming section that forms a plurality of charged particle beams on a sample; an energy control unit that controls the incident energy of the plurality of charged particle beams that are irradiated onto the sample; a beam current control unit that controls the beam current of the plurality of charged particle beams that are irradiated onto the sample; and a beam arrangement control unit that controls the arrangement in which the plurality of charged particle beams is irradiated onto the sample. The beam-forming section includes a beam splitting electrode, a lens array upper electrode, a lens array middle electrode, a lens array lower electrode and a movable stage, and functions as the beam current control unit or the beam arrangement control unit through selection, by the movable stage, of a plurality of aperture pattern sets.
Public/Granted literature
- US20130299697A1 CHARGED PARTICLE BEAM APPLIED APPARATUS, AND IRRADIATION METHOD Public/Granted day:2013-11-14
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