Invention Grant
US08997684B2 Prevention of particle adders when contacting a liquid meniscus over a substrate
有权
当在液体弯液面上接触衬底时，防止颗粒加料器
- Patent Title: Prevention of particle adders when contacting a liquid meniscus over a substrate
- Patent Title (中): 当在液体弯液面上接触衬底时，防止颗粒加料器
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Application No.: US13250872Application Date: 2011-09-30
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Publication No.: US08997684B2Publication Date: 2015-04-07
- Inventor: Enrico Magni , Suresh Gupta , Mark Gahagan , Eric Lenz , Mike Ravkin
- Applicant: Enrico Magni , Suresh Gupta , Mark Gahagan , Eric Lenz , Mike Ravkin
- Applicant Address: US CA Fremont
- Assignee: Lam Research Corporation
- Current Assignee: Lam Research Corporation
- Current Assignee Address: US CA Fremont
- Agency: Martine Penilla Group, LLP
- Main IPC: B05C11/00
- IPC: B05C11/00 ; H01L21/67 ; B05C11/10 ; B05C5/02 ; H01L21/677 ; B05D3/10 ; B05D3/00
Abstract:
A method for meniscus processing a substrate is provided. The method initiates with generating a meniscus spanning at least a length of the substrate. A pre-wetting liquid or vapor is dispensed. A substrate is moved through the dispensed pre-wetting liquid or vapor and the meniscus. The dispensed pre-wetting vapor condenses a pre-wetting liquid over a region of the substrate adjacent to a region of the substrate where the meniscus is generated. The pre-wetting liquid is deposited without substantially generating surface flow of the pre-wetting liquid on the substrate, and the pre-wetting liquid prevents the leading edge of the meniscus from contacting a dry surface region of the substrate.
Public/Granted literature
- US20130084392A1 PREVENTION OF PARTICLE ADDERS WHEN CONTACTING A LIQUID MENISCUS OVER A SUBSTRATE Public/Granted day:2013-04-04
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