Invention Grant
- Patent Title: Method for producing monosilane and tetraalkoxysilane
- Patent Title (中): 单硅烷和四烷氧基硅烷的制备方法
-
Application No.: US13509118Application Date: 2010-11-24
-
Publication No.: US09045503B2Publication Date: 2015-06-02
- Inventor: Hiromoto Ohno , Toshio Ohi , Haruaki Ito , Fanil Makhmutov
- Applicant: Hiromoto Ohno , Toshio Ohi , Haruaki Ito , Fanil Makhmutov
- Applicant Address: JP Tokyo
- Assignee: SHOWA DENKO K.K.
- Current Assignee: SHOWA DENKO K.K.
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2009-267094 20091125
- International Application: PCT/JP2010/070883 WO 20101124
- International Announcement: WO2011/065359 WO 20110603
- Main IPC: C07F7/08
- IPC: C07F7/08 ; C07F7/04 ; B01J27/16 ; B01J27/188 ; C01B33/04 ; B01J37/02 ; B01J37/03 ; B01J23/28 ; B01J23/30 ; B01J27/19 ; B01J35/08 ; B01J35/10 ; B01J21/06

Abstract:
The present invention relates to a method for producing monosilane and tetraalkoxysilane comprising subjecting alkoxysilane represented by formula (1) HnSi(OR)4−n (1) wherein R represents alkyl group having 1 to 6 carbon atoms and n represents an integer of from 1 to 3, to disproportionation reaction in a gaseous phase in the presence of an inorganic phosphate or a catalyst having a specific chemical structure based on a heteropolyacid salt structure. In the production method of the present invention, separation from the solvent can be carried out easily, the reaction proceeds quickly and the conversion rate of the starting materials is high.
Public/Granted literature
- US20120226064A1 METHOD FOR PRODUCING MONOSILANE AND TETRAALKOXYSILANE Public/Granted day:2012-09-06
Information query