Invention Grant
US09092847B2 Detection of thin lines for selective sensitivity during reticle inspection using processed images
有权
在使用处理图像的掩模版检查期间检测细线以选择灵敏度
- Patent Title: Detection of thin lines for selective sensitivity during reticle inspection using processed images
- Patent Title (中): 在使用处理图像的掩模版检查期间检测细线以选择灵敏度
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Application No.: US14475400Application Date: 2014-09-02
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Publication No.: US09092847B2Publication Date: 2015-07-28
- Inventor: Zhengyu Wang , Rui-fang Shi , Lih-Huah Yiin , Bing Li
- Applicant: KLA-Tencor Corporation
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Corporation
- Current Assignee: KLA-Tencor Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Kwan & Olynick LLP
- Main IPC: G06K9/62
- IPC: G06K9/62 ; G06T7/00 ; G03F1/84 ; G01N21/956

Abstract:
A detection method for a spot image based thin line detection is disclosed. The method includes a step for constructing a band limited spot image from a transmitted and reflected optical image of the mask. The spot image is calibrated to reduce noise introduced by the one or more inspection systems. Based on the band limited spot image, a non-printable feature map is generated for the non-printable features and a printable feature map is generated for the printable features. One or more test images of the mask are analyzed to detect defects on such mask. A sensitivity level of defect detection is reduced in areas of the one or more test images defined by the non-printable feature map, as compared with areas of the one or more test images that are not defined by the non-printable features map
Public/Granted literature
- US20140369593A1 DETECTION OF THIN LINES FOR SELECTIVE SENSITIVITY DURING RETICLE INSPECTION USING PROCESSED IMAGES Public/Granted day:2014-12-18
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