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1.发明申请公开(公告)号：US20150005917A1
公开(公告)日：2015-01-01
申请号：US14370101
申请日：2012-10-01
Applicant: KLA-Tencor Corporation
Inventor： Lih-Huah Yiin , Venkatraman K. Iyer , Rui-fang Shi
IPC: G05B19/418 , G06F17/30
CPC classification number: G05B19/41875 , G03F1/36 , G03F1/44 , G03F1/84 , G05B2219/31304 , G06F17/30587
Abstract: A method embodiment includes providing a reticle design data that specify a plurality of printable features that are formed on the wafer using the reticle and a plurality of nonprintable features that are not formed on the wafer using such reticle, wherein the reticle design data is usable to fabricate the reticle. A reduced design database is generated from the reticle design data and this reduced design database includes a description or map of the nonprintable features of the reticle, a description or map of a plurality of cell-to-cell regions of the reticle, and a grayscale reticle image that is rasterized from the reticle design data. The reduced design database, along with the reticle, is transferred to a fabrication facility so that the reduced design database is usable to periodically inspect the reticle in the fabrication facility.
Abstract translation: 一种方法实施例包括提供一种掩模版设计数据，其使用所述掩模版指定在所述晶片上形成的多个可打印特征，以及使用所述掩模版未在所述晶片上形成的多个不可打印特征，其中所述标线设计数据可用于 制作掩模版。 从掩模版设计数据生成缩减的设计数据库，并且该缩减的设计数据库包括掩模版的不可打印特征的描述或图，掩模版的多个单元到单元区域的描述或映射，以及灰度 光栅图案，从光栅设计数据光栅化。 减少的设计数据库以及掩模版被传送到制造设施，使得减少的设计数据库可用于周期性地检查制造设备中的掩模版。
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公开(公告)号：US09733640B2
公开(公告)日：2017-08-15
申请号：US14370101
申请日：2012-10-01
Applicant: KLA-Tencor Corporation
Inventor： Lih-Huah Yiin , Venkatraman K. Iyer , Rui-fang Shi
CPC classification number: G05B19/41875 , G03F1/36 , G03F1/44 , G03F1/84 , G05B2219/31304 , G06F17/30587
Abstract: A method embodiment includes providing a reticle design data that specify a plurality of printable features that are formed on the wafer using the reticle and a plurality of nonprintable features that are not formed on the wafer using such reticle, wherein the reticle design data is usable to fabricate the reticle. A reduced design database is generated from the reticle design data and this reduced design database includes a description or map of the nonprintable features of the reticle, a description or map of a plurality of cell-to-cell regions of the reticle, and a grayscale reticle image that is rasterized from the reticle design data. The reduced design database, along with the reticle, is transferred to a fabrication facility so that the reduced design database is usable to periodically inspect the reticle in the fabrication facility.
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3.发明授权Detection of thin lines for selective sensitivity during reticle inspection using processed images 有权在使用处理图像的掩模版检查期间检测细线以选择灵敏度公开(公告)号：US09092847B2
公开(公告)日：2015-07-28
申请号：US14475400
申请日：2014-09-02
Applicant: KLA-Tencor Corporation
Inventor： Zhengyu Wang , Rui-fang Shi , Lih-Huah Yiin , Bing Li
IPC: G06K9/62 , G06T7/00 , G03F1/84 , G01N21/956
CPC classification number: G06T7/001 , G01N2021/95676 , G03F1/84 , G06T7/13 , G06T7/174 , G06T2207/10016 , G06T2207/10152 , G06T2207/20044 , G06T2207/20161 , G06T2207/20221 , G06T2207/30148
Abstract: A detection method for a spot image based thin line detection is disclosed. The method includes a step for constructing a band limited spot image from a transmitted and reflected optical image of the mask. The spot image is calibrated to reduce noise introduced by the one or more inspection systems. Based on the band limited spot image, a non-printable feature map is generated for the non-printable features and a printable feature map is generated for the printable features. One or more test images of the mask are analyzed to detect defects on such mask. A sensitivity level of defect detection is reduced in areas of the one or more test images defined by the non-printable feature map, as compared with areas of the one or more test images that are not defined by the non-printable features map
Abstract translation: 公开了一种用于基于点图像的细线检测的检测方法。 该方法包括从掩模的透射和反射光学图像构造带限光斑图像的步骤。 斑点图像被校准以减少由一个或多个检查系统引入的噪声。 基于带限点图像，为不可打印的特征生成不可打印的特征图，并且为可打印特征生成可打印的特征图。 分析掩模的一个或多个测试图像以检测该掩模上的缺陷。 与由不可打印的特征图定义的一个或多个测试图像的区域相比，在由不可打印的特征图定义的一个或多个测试图像的区域中减少了缺陷检测的灵敏度水平
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4.发明申请公开(公告)号：US20140369593A1
公开(公告)日：2014-12-18
申请号：US14475400
申请日：2014-09-02
Applicant: KLA-Tencor Corporation
Inventor： Zhengyu Wang , Rui-fang Shi , Lih-Huah Yiin , Bing Li
CPC classification number: G06T7/001 , G01N2021/95676 , G03F1/84 , G06T7/13 , G06T7/174 , G06T2207/10016 , G06T2207/10152 , G06T2207/20044 , G06T2207/20161 , G06T2207/20221 , G06T2207/30148
Abstract: A detection method for a spot image based thin line detection is disclosed. The method includes a step for constructing a band limited spot image from a transmitted and reflected optical image of the mask. The spot image is calibrated to reduce noise introduced by the one or more inspection systems. Based on the band limited spot image, a non-printable feature map is generated for the non-printable features and a printable feature map is generated for the printable features. One or more test images of the mask are analyzed to detect defects on such mask. A sensitivity level of defect detection is reduced in areas of the one or more test images defined by the non-printable feature map, as compared with areas of the one or more test images that are not defined by the non-printable features map
Abstract translation: 公开了一种用于基于点图像的细线检测的检测方法。 该方法包括从掩模的透射和反射光学图像构造带限光斑图像的步骤。 斑点图像被校准以减少由一个或多个检查系统引入的噪声。 基于带限点图像，为不可打印的特征生成不可打印的特征图，并且为可打印特征生成可打印的特征图。 分析掩模的一个或多个测试图像以检测该掩模上的缺陷。 与由不可打印的特征图定义的一个或多个测试图像的区域相比，在由不可打印的特征图定义的一个或多个测试图像的区域中减少了缺陷检测的灵敏度水平
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