Invention Grant
US09105438B2 Imaging and processing for plasma ion source 有权
等离子体离子源的成像和处理

Imaging and processing for plasma ion source
Abstract:
Applicants have found that energetic neutral particles created by a charged exchange interaction between high energy ions and neutral gas molecules reach the sample in a ion beam system using a plasma source. The energetic neutral create secondary electrons away from the beam impact point. Methods to solve the problem include differentially pumped chambers below the plasma source to reduce the opportunity for the ions to interact with gas.
Public/Granted literature
Information query
Patent Agency Ranking
0/0