Invention Grant
- Patent Title: Imaging and processing for plasma ion source
- Patent Title (中): 等离子体离子源的成像和处理
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Application No.: US13891545Application Date: 2013-05-10
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Publication No.: US09105438B2Publication Date: 2015-08-11
- Inventor: Tom Miller , Sean Kellogg , Shouyin Zhang , Mostafa Maazouz , Anthony Graupera
- Applicant: FEI Company
- Applicant Address: US OR Hillsboro
- Assignee: FEI COMPANY
- Current Assignee: FEI COMPANY
- Current Assignee Address: US OR Hillsboro
- Agency: Scheinberg & Associates
- Agent Michael O. Scheinberg
- Main IPC: H01J37/08
- IPC: H01J37/08 ; H01J37/02 ; H01J37/16 ; H01J37/18

Abstract:
Applicants have found that energetic neutral particles created by a charged exchange interaction between high energy ions and neutral gas molecules reach the sample in a ion beam system using a plasma source. The energetic neutral create secondary electrons away from the beam impact point. Methods to solve the problem include differentially pumped chambers below the plasma source to reduce the opportunity for the ions to interact with gas.
Public/Granted literature
- US20130320229A1 IMAGING AND PROCESSING FOR PLASMA ION SOURCE Public/Granted day:2013-12-05
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