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1.发明申请公开(公告)号：US20150357166A1
公开(公告)日：2015-12-10
申请号：US14734905
申请日：2015-06-09
Applicant: FEI Company
Inventor： Sean Kellogg , Anthony Graupera , William N. Parker , Andrew B. Wells , Mark W. Utlaut , Walter Skoczylas , Gregory A. Schwind , Noel Smith , Shouyin Zhang
CPC classification number: H01J37/32605 , H01J9/02 , H01J27/16 , H01J37/04 , H01J37/08 , H01J2237/032
Abstract: An inductively coupled plasma charged particle source for focused ion beam systems includes a plasma reaction chamber with a removably attached source electrode. A fastening mechanism connects the source electrode with the plasma reaction chamber and allows for a heat-conductive, vacuum seal to form. With a removable source electrode, improved serviceability and reuse of the plasma source tube are now possible.
Abstract translation: 用于聚焦离子束系统的电感耦合等离子体带电粒子源包括具有可拆卸地附接的源电极的等离子体反应室。 紧固机构将源电极与等离子体反应室连接，并形成导热的真空密封。 使用可移动的源电极，现在可以提高等离子体源管的可用性和再利用。
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2.发明授权公开(公告)号：US09530625B2
公开(公告)日：2016-12-27
申请号：US14734905
申请日：2015-06-09
Applicant: FEI Company
Inventor： Sean Kellogg , Anthony Graupera , William N. Parker , Andrew B. Wells , Mark W. Utlaut , Walter Skoczylas , Gregory A. Schwind , Noel Smith , Shouyin Zhang
CPC classification number: H01J37/32605 , H01J9/02 , H01J27/16 , H01J37/04 , H01J37/08 , H01J2237/032
Abstract: An inductively coupled plasma charged particle source for focused ion beam systems includes a plasma reaction chamber with a removably attached source electrode. A fastening mechanism connects the source electrode with the plasma reaction chamber and allows for a heat-conductive, vacuum seal to form. With a removable source electrode, improved serviceability and reuse of the plasma source tube are now possible.
Abstract translation: 用于聚焦离子束系统的电感耦合等离子体带电粒子源包括具有可拆卸地附接的源电极的等离子体反应室。 紧固机构将源电极与等离子体反应室连接，并形成导热的真空密封。 使用可移动的源电极，现在可以提高等离子体源管的可用性和再利用。
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公开(公告)号：US09818584B2
公开(公告)日：2017-11-14
申请号：US14325146
申请日：2014-07-07
Applicant: FEI Company
Inventor： Thomas G. Miller , Shouyin Zhang
CPC classification number: H01J37/32651 , H01J37/08 , H01J37/321 , H01J37/32504 , H01J2237/0206 , H01J2237/026 , H01J2237/31749
Abstract: An inductively coupled plasma source for a focused charged particle beam system includes a conductive shield within the plasma chamber in order to reduce capacitative coupling to the plasma. The internal conductive shield is maintained at substantially the same potential as the plasma source by a biasing electrode or by the plasma. The internal shield allows for a wider variety of cooling methods on the exterior of the plasma chamber.
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Patent Agency Ranking
公开(公告)号：US09691583B2
公开(公告)日：2017-06-27
申请号：US14792771
申请日：2015-07-07
Applicant: FEI Company
Inventor： Thomas G. Miller , Sean Kellogg , Shouyin Zhang , Mostafa Maazouz , Anthony Graupera
CPC classification number: H01J37/08 , H01J37/026 , H01J37/10 , H01J37/16 , H01J37/18 , H01J37/185 , H01J37/3007 , H01J37/3171 , H01J2237/0492 , H01J2237/08 , H01J2237/18 , H01J2237/188 , H01J2237/31713 , H01J2237/31749
Abstract: Applicants have found that energetic neutral particles created by a charged exchange interaction between high energy ions and neutral gas molecules reach the sample in a ion beam system using a plasma source. The energetic neutral create secondary electrons away from the beam impact point. Methods to solve the problem include differentially pumped chambers below the plasma source to reduce the opportunity for the ions to interact with gas.
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公开(公告)号：US20150380204A1
公开(公告)日：2015-12-31
申请号：US14792771
申请日：2015-07-07
Applicant: FEI Company
Inventor： Thomas G. Miller , Sean Kellogg , Shouyin Zhang , Mostafa Maazouz , Anthony Graupera
IPC: H01J37/08 , H01J37/10 , H01J37/18 , H01J37/317 , H01J37/30
CPC classification number: H01J37/08 , H01J37/026 , H01J37/10 , H01J37/16 , H01J37/18 , H01J37/185 , H01J37/3007 , H01J37/3171 , H01J2237/0492 , H01J2237/08 , H01J2237/18 , H01J2237/188 , H01J2237/31713 , H01J2237/31749
Abstract: Applicants have found that energetic neutral particles created by a charged exchange interaction between high energy ions and neutral gas molecules reach the sample in a ion beam system using a plasma source. The energetic neutral create secondary electrons away from the beam impact point. Methods to solve the problem include differentially pumped chambers below the plasma source to reduce the opportunity for the ions to interact with gas.
Abstract translation: 申请人已经发现，通过高能离子和中性气体分子之间的电荷交换相互作用产生的高能中性粒子使用等离子体源在离子束系统中到达样品。 能量中性产生离子束冲击点的二次电子。 解决问题的方法包括等离子体源下面的差分泵浦腔，以减少离子与气体相互作用的机会。
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公开(公告)号：US09105438B2
公开(公告)日：2015-08-11
申请号：US13891545
申请日：2013-05-10
Applicant: FEI Company
Inventor： Tom Miller , Sean Kellogg , Shouyin Zhang , Mostafa Maazouz , Anthony Graupera
CPC classification number: H01J37/08 , H01J37/026 , H01J37/10 , H01J37/16 , H01J37/18 , H01J37/185 , H01J37/3007 , H01J37/3171 , H01J2237/0492 , H01J2237/08 , H01J2237/18 , H01J2237/188 , H01J2237/31713 , H01J2237/31749
Abstract: Applicants have found that energetic neutral particles created by a charged exchange interaction between high energy ions and neutral gas molecules reach the sample in a ion beam system using a plasma source. The energetic neutral create secondary electrons away from the beam impact point. Methods to solve the problem include differentially pumped chambers below the plasma source to reduce the opportunity for the ions to interact with gas.
Abstract translation: 申请人已经发现，通过高能离子和中性气体分子之间的电荷交换相互作用产生的高能中性粒子使用等离子体源在离子束系统中到达样品。 能量中性产生离子束冲击点的二次电子。 解决问题的方法包括等离子体源下面的差分泵浦腔，以减少离子与气体相互作用的机会。
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7.发明申请公开(公告)号：US20150008213A1
公开(公告)日：2015-01-08
申请号：US14325146
申请日：2014-07-07
Applicant: FEI Company
Inventor： Thomas G. Miller , Shouyin Zhang
IPC: H01J37/32
CPC classification number: H01J37/32651 , H01J37/08 , H01J37/321 , H01J37/32504 , H01J2237/0206 , H01J2237/026 , H01J2237/31749
Abstract: An inductively coupled plasma source for a focused charged particle beam system includes a conductive shield within the plasma chamber in order to reduce capacitative coupling to the plasma. The internal conductive shield is maintained at substantially the same potential as the plasma source by a biasing electrode or by the plasma. The internal shield allows for a wider variety of cooling methods on the exterior of the plasma chamber.
Abstract translation: 用于聚焦带电粒子束系统的电感耦合等离子体源包括在等离子体室内的导电屏蔽，以便减少与等离子体的电容耦合。 通过偏置电极或等离子体将内部导电屏蔽层保持在与等离子体源大致相同的电位。 内部屏蔽允许在等离子体室的外部使用更多种类的冷却方法。
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公开(公告)号：US20130320229A1
公开(公告)日：2013-12-05
申请号：US13891545
申请日：2013-05-10
Applicant: FEI Company
Inventor： Tom Miller , Sean Kellogg , Shouyin Zhang , Mostafa Maazouz , Anthony Graupera
IPC: H01J37/08
CPC classification number: H01J37/08 , H01J37/026 , H01J37/10 , H01J37/16 , H01J37/18 , H01J37/185 , H01J37/3007 , H01J37/3171 , H01J2237/0492 , H01J2237/08 , H01J2237/18 , H01J2237/188 , H01J2237/31713 , H01J2237/31749
Abstract: Applicants have found that energetic neutral particles created by a charged exchange interaction between high energy ions and neutral gas molecules reach the sample in a ion beam system using a plasma source. The energetic neutral create secondary electrons away from the beam impact point. Methods to solve the problem include differentially pumped chambers below the plasma source to reduce the opportunity for the ions to interact with gas.
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