Invention Grant
- Patent Title: Device for correcting diffraction aberration of electron beam
- Patent Title (中): 用于校正电子束衍射像差的装置
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Application No.: US13977139Application Date: 2011-12-26
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Publication No.: US09123501B2Publication Date: 2015-09-01
- Inventor: Muneyuki Fukuda , Yoichi Ose , Mitsugu Sato , Hiroyuki Ito , Hiroshi Suzuki , Naomasa Suzuki
- Applicant: Muneyuki Fukuda , Yoichi Ose , Mitsugu Sato , Hiroyuki Ito , Hiroshi Suzuki , Naomasa Suzuki
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Miles & Stockbridge P.C.
- Priority: JP2010-291519 20101228
- International Application: PCT/JP2011/007244 WO 20111226
- International Announcement: WO2012/090464 WO 20120705
- Main IPC: H01J37/14
- IPC: H01J37/14 ; H01J37/26 ; H01J37/10 ; H01J37/153 ; H01J37/147

Abstract:
A diffraction aberration corrector formed by the multipole of the solenoid coil ring and having a function of adjusting the degree of orthogonality or axial shift of the vector potential with respect to the beam axis. In order to cause a phase difference, the diffraction aberration corrector that induces a vector potential, which is perpendicular to the beam axis and has a symmetrical distribution within the orthogonal plane with respect to the beam axis, is provided near the objective aperture and the objective lens. A diffracted wave traveling in a state of being inclined from the beam axis passes through the ring of the magnetic flux. Since the phase difference within the beam diameter is increased by the Aharonov-Bohm effect due to the vector potential, the intensity of the electron beam on the sample is suppressed.
Public/Granted literature
- US20140124664A1 DEVICE FOR CORRECTING DIFFRACTION ABERRATION OF ELECTRON BEAM Public/Granted day:2014-05-08
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