Invention Grant
- Patent Title: Ionization with femtosecond lasers at elevated pressure
- Patent Title (中): 飞秒激光器在高压下电离
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Application No.: US14368686Application Date: 2012-12-04
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Publication No.: US09165753B2Publication Date: 2015-10-20
- Inventor: Alexandre V. Loboda , Paul Corkum , David Rayner
- Applicant: DH Technologies Development Pte. Ltd. , National Research Council of Canada
- Applicant Address: SG Singapore CA
- Assignee: DH Technologies Development Pte. Ltd.,National Research Council of Canada
- Current Assignee: DH Technologies Development Pte. Ltd.,National Research Council of Canada
- Current Assignee Address: SG Singapore CA
- International Application: PCT/IB2012/002586 WO 20121204
- International Announcement: WO2013/098610 WO 20130704
- Main IPC: H01J49/00
- IPC: H01J49/00 ; H01J49/14 ; H01J49/16 ; H01J49/04 ; H01J49/26

Abstract:
The present disclosure generally provides ionization methods and devices for use in mass spectrometry. In some embodiments, the ionization methods and devices employ short laser pulses (e.g., pulses having pulsewidths in a range of about 2 fs to about 1 ps) at a high intensity (e.g., an intensity in a range of about 1 TW/cm2 to about 1000 TW/cm2) to ionize an analyte an ambient pressure greater than about 10−5 Torr (e.g., an ambient pressure in a range of about 1 atmosphere to about 100 atmospheres).
Public/Granted literature
- US20150008313A1 IONIZATION WITH FEMTOSECOND LASERS AT ELEVATED PRESSURE Public/Granted day:2015-01-08
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