Invention Grant
US09165807B2 Substrate treating apparatus with vertical treatment arrangement including vertical blowout and exhaust units
有权
具有立式处理装置的基板处理装置，包括垂直井喷和排气单元
- Patent Title: Substrate treating apparatus with vertical treatment arrangement including vertical blowout and exhaust units
- Patent Title (中): 具有立式处理装置的基板处理装置，包括垂直井喷和排气单元
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Application No.: US13401644Application Date: 2012-02-21
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Publication No.: US09165807B2Publication Date: 2015-10-20
- Inventor: Yoshiteru Fukutomi , Tsuyoshi Mitsuhashi , Hiroyuki Ogura , Kenya Morinishi , Yasuo Kawamatsu , Hiromichi Nagashima
- Applicant: Yoshiteru Fukutomi , Tsuyoshi Mitsuhashi , Hiroyuki Ogura , Kenya Morinishi , Yasuo Kawamatsu , Hiromichi Nagashima
- Applicant Address: JP Kyoto
- Assignee: Screen Semiconductor Solutions Co., Ltd.
- Current Assignee: Screen Semiconductor Solutions Co., Ltd.
- Current Assignee Address: JP Kyoto
- Agency: Kilpatrick Townsend & Stockton LLP
- Priority: JP2007-172496 20070629
- Main IPC: C23C16/00
- IPC: C23C16/00 ; H01L21/67 ; B05C13/00 ; B05D3/04 ; B05B15/12 ; H01L23/34
Abstract:
A substrate treating apparatus includes a treating block including a plurality of cells arranged one over another. Each cell has treating units for treating substrates and a single main transport mechanism for transporting the substrates to the treating units. Each cell also has a blowout unit for supplying a clean gas into a transporting space of the main transport mechanism and an exhaust unit for exhausting gas from the transporting space. The blowout unit and the exhaust unit are arranged one over the other in the transporting space to separate the transporting space of each cell from that of another cell.
Public/Granted literature
- US20120145074A1 SUBSTRATE TREATING APPARATUS Public/Granted day:2012-06-14
Information query
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