Invention Grant
US09171694B2 Asymmetric electrostatic quadrupole deflector for improved field uniformity
有权
非对称静电四极偏转器,用于改善场均匀性
- Patent Title: Asymmetric electrostatic quadrupole deflector for improved field uniformity
- Patent Title (中): 非对称静电四极偏转器,用于改善场均匀性
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Application No.: US14532805Application Date: 2014-11-04
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Publication No.: US09171694B2Publication Date: 2015-10-27
- Inventor: Christopher Sears
- Applicant: KLA-Tencor Corporation
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Corporation
- Current Assignee: KLA-Tencor Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Suiter Swantz pc llo
- Main IPC: H01J37/147
- IPC: H01J37/147 ; H01J37/141 ; H01J37/12 ; H01J37/153 ; H01J37/10

Abstract:
An electron beam device for inspecting a target substrate or specimen thereon includes a beam separator with an asymmetric quadrupole electrostatic deflector for improving field uniformity for a single direction of deflection. The asymmetric quadrupole electrostatic deflector includes two orthogonal electrode plates spanning roughly 60 degrees and two electrode plates spanning roughly 120 degrees, the two latter plates defining a unidirectional deflection field. The device generates a primary electron beam and focuses the primary electron beam along an optical axis into the target substrate. Secondary electrons detected at the target substrate are focused into a secondary electron beam. The beam separator with asymmetric quadrupole electrostatic deflector deflects the secondary electron beam away from the axis of the primary electron beam in the direction of deflection and into a detector array.
Public/Granted literature
- US20150144785A1 Asymmetric Electrostatic Quadrupole Deflector for Improved Field Uniformity Public/Granted day:2015-05-28
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