Invention Grant
- Patent Title: Lithographic apparatus and methods for determining an improved configuration of a lithographic apparatus
- Patent Title (中): 用于确定光刻设备的改进配置的光刻设备和方法
-
Application No.: US13359244Application Date: 2012-01-26
-
Publication No.: US09229336B2Publication Date: 2016-01-05
- Inventor: Jozef Maria Finders , Bernardo Kastrup , Sander De Putter
- Applicant: Jozef Maria Finders , Bernardo Kastrup , Sander De Putter
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/68
- IPC: G03B27/68 ; G03F7/20
Abstract:
A method to determine an improved configuration for a lithography apparatus, a computer-readable medium for use in carrying out the method, and a lithography apparatus are disclosed. In an example, the method involves intelligent selection of one or more device features to measure and use in a routine to optimize the configuration of the lithography apparatus. According to an example, the method comprises imposing a target error profile to one or more device features for which measurement data is not sufficient, for example in a regions where a selected device feature is sparsely distributed.
Public/Granted literature
- US20120194797A1 LITHOGRAPHIC APPARATUS AND METHODS FOR DETERMINING AN IMPROVED CONFIGURATION OF A LITHOGRAPHIC APPARATUS Public/Granted day:2012-08-02
Information query
