Invention Grant
- Patent Title: Charged particle beam device
- Patent Title (中): 带电粒子束装置
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Application No.: US14379694Application Date: 2013-02-20
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Publication No.: US09245710B2Publication Date: 2016-01-26
- Inventor: Kazuhiro Gunji , Yasushi Ebizuka , Yuta Asaga
- Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
- Applicant Address: JP Tokyo
- Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
- Current Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: McDermott Will & Emery LLP
- Priority: JP2012-046046 20120302
- International Application: PCT/JP2013/054224 WO 20130220
- International Announcement: WO2013/129210 WO 20130906
- Main IPC: H01J37/18
- IPC: H01J37/18 ; H01J37/16 ; H01J37/20 ; H01J37/28

Abstract:
A charged particle beam device that appropriately maintains a throughput of the device for each of specimens different in a gas emission volume from each other is provided. A scanning electron microscope includes an electron source, a specimen stage, a specimen chamber, and an exchange chamber, and further includes a vacuum gauge that measures an internal pressure of the exchange chamber, a time counting unit that counts time taken when a measurement result by the vacuum gauge has reached a predetermined degree of vacuum, and an integral control unit that performs comparative calculation and determination based on a measurement result by the time counting unit and integral control based on a process flow. And, the integral control unit controls changing of a content of a subsequent process based on a shift of the degree of vacuum of the exchange chamber.
Public/Granted literature
- US20150060694A1 CHARGED PARTICLE BEAM DEVICE Public/Granted day:2015-03-05
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