Invention Grant
- Patent Title: Compositions and processes for photolithography
- Patent Title (中): 光刻的组成和工艺
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Application No.: US14301177Application Date: 2014-06-10
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Publication No.: US09274427B2Publication Date: 2016-03-01
- Inventor: Deyan Wang , Chunyi Wu
- Applicant: Rohm and Haas Electronic Materials LLC
- Applicant Address: US MA Marlborough
- Assignee: Rohm and Haas Electronic Materials LLC
- Current Assignee: Rohm and Haas Electronic Materials LLC
- Current Assignee Address: US MA Marlborough
- Agent Jonathan D. Baskin
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/20 ; C08F18/00 ; G03F7/11 ; C08L33/16 ; H01L21/027
Abstract:
Topcoat layer compositions are provided that are applied above a photoresist composition. The compositions find particular applicability to immersion lithography processing.
Public/Granted literature
- US20140295348A1 COMPOSITIONS AND PROCESSES FOR PHOTOLITHOGRAPHY Public/Granted day:2014-10-02
Information query
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