Invention Grant
- Patent Title: Sputter neutral particle mass spectrometry apparatus
- Patent Title (中): 溅射中性粒子质谱仪
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Application No.: US14640766Application Date: 2015-03-06
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Publication No.: US09299552B2Publication Date: 2016-03-29
- Inventor: Toma Yorisaki
- Applicant: KABUSHIKI KAISHA TOSHIBA
- Applicant Address: JP Minato-ku
- Assignee: KABUSHIKI KAISHA TOSHIBA
- Current Assignee: KABUSHIKI KAISHA TOSHIBA
- Current Assignee Address: JP Minato-ku
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P
- Priority: JP2014-054601 20140318
- Main IPC: H01J49/26
- IPC: H01J49/26 ; H01J49/16 ; H01J49/04 ; H01J49/06

Abstract:
A sputter neutral particle mass spectrometry apparatus includes a sample table holding a sample which is a mass spectrometry target, and comprising a temperature control mechanism for the sample, an ion beam irradiation device which irradiates an ion beam on the sample to generate neutral particles, a laser irradiation device which irradiates the neutral particles with a laser to obtain photoexcited ions, a mass spectrometer which draws in the drawn out photoexcited ions and performs mass analysis, a driving system mirror which is provided retractably on a laser light path between the laser irradiation device and the sample table, and reflects the laser when positioned within the laser light path, and, a profiler which is arranged in a reflective direction of the driving system mirror and detects a feature of the laser.
Public/Granted literature
- US20150270112A1 SPUTTER NEUTRAL PARTICLE MASS SPECTROMETRY APPARATUS Public/Granted day:2015-09-24
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