Invention Grant
US09305764B2 Plasma light source, inspection apparatus including plasma light source, and method of generating plasma light
有权
等离子体光源,包括等离子体光源的检查装置和产生等离子体光的方法
- Patent Title: Plasma light source, inspection apparatus including plasma light source, and method of generating plasma light
- Patent Title (中): 等离子体光源,包括等离子体光源的检查装置和产生等离子体光的方法
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Application No.: US14613988Application Date: 2015-02-04
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Publication No.: US09305764B2Publication Date: 2016-04-05
- Inventor: Young-kyu Park , Wook-rae Kim , Kwang-soo Kim , Tae-joong Kim , Byeong-hwan Jeon
- Applicant: Young-kyu Park , Wook-rae Kim , Kwang-soo Kim , Tae-joong Kim , Byeong-hwan Jeon
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Myers Bigel & Sibley, PA
- Priority: KR10-2014-0081983 20140701
- Main IPC: H01J61/28
- IPC: H01J61/28 ; H01J65/04 ; G02B27/14

Abstract:
A plasma light source includes a chamber having an ionizable medium therein, an ignition source configured to provide first electromagnetic radiation to the chamber, a sustaining source configured to separately provide second electromagnetic radiation to the chamber, a first curved mirror positioned adjacent the chamber, and a second curved mirror positioned opposite the first mirror and arranged to direct the first electromagnetic radiation toward the chamber. The second electromagnetic radiation may be different than the first electromagnetic radiation. Related devices and methods of operation are also discussed.
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