Invention Grant
- Patent Title: Optical proximity correction verification system and verification method thereof
- Patent Title (中): 光学邻近校正验证系统及其验证方法
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Application No.: US14935464Application Date: 2015-11-09
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Publication No.: US09330229B2Publication Date: 2016-05-03
- Inventor: Chung-Chih Chang , Kuo-Hsun Huang , Chao-Yao Chiang
- Applicant: UNITED MICROELECTRONICS CORP.
- Applicant Address: TW Science-Based Industrial Park, Hsin-Chu
- Assignee: UNITED MICROELECTRONICS CORP.
- Current Assignee: UNITED MICROELECTRONICS CORP.
- Current Assignee Address: TW Science-Based Industrial Park, Hsin-Chu
- Agent Winston Hsu; Scott Margo
- Priority: TW103125327A 20140724
- Main IPC: G06F17/50
- IPC: G06F17/50 ; G03F1/36
Abstract:
The optical proximity correction verification method includes loading a layout data to be verified to a processor, loading a reference layout data to the processor. The processor performs a first stage Boolean operation on the layout data to be verified to generate a first verified data. The processor performs a layout versus layout verification on the first verified data by using a user-defined verification tool of optical proximity correction data in a database to generate second verified data according to the reference layout data. The processor performs a second stage Boolean operation on the second verified data to generate a third verified data if the layout versus layout verification is successfully performed. The processor performs a Boolean check on the third verified data to generate fourth verified data using the reference layout data.
Public/Granted literature
- US20160063173A1 Optical Proximity Correction Verification System and Verification Method Thereof Public/Granted day:2016-03-03
Information query
