Invention Grant
- Patent Title: Reflected signal absorption in interconnect
- Patent Title (中): 互连中的反射信号吸收
-
Application No.: US14303396Application Date: 2014-06-12
-
Publication No.: US09351394B2Publication Date: 2016-05-24
- Inventor: Shaowu Huang , John J. Abbott
- Applicant: INTEL CORPORATION
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Schwabe, Williamson & Wyatt, P.C.
- Main IPC: H05K1/11
- IPC: H05K1/11 ; H05K1/02 ; H01R12/71 ; H01R13/6598

Abstract:
Embodiments of the present disclosure are directed toward techniques and configurations for electrical signal absorption in an interconnect stub. In one instance, a printed circuit board (PCB) assembly may comprise a substrate and an interconnect (such as a via) formed in the substrate to route an electrical signal within the PCB. The interconnect may include a stub formed on the interconnect. At least a portion of the stub may be covered with an absorbing material to at least partially absorb a portion of the electric signal that is reflected by the stub. The absorbing material may be selected such that its dielectric loss tangent is greater than one, for a frequency range of a frequency of the reflected portion of the electric signal. A dielectric constant of the absorbing material may be inversely proportionate to the frequency of the reflected electric signal. Other embodiments may be described and/or claimed.
Public/Granted literature
- US20150366052A1 REFLECTED SIGNAL ABSORPTION IN INTERCONNECT Public/Granted day:2015-12-17
Information query