Invention Grant
- Patent Title: Charged particle beam apparatus and sample observation method
- Patent Title (中): 带电粒子束装置和样品观察方法
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Application No.: US14601478Application Date: 2015-01-21
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Publication No.: US09384941B2Publication Date: 2016-07-05
- Inventor: Xin Man
- Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION
- Applicant Address: JP
- Assignee: HITACHI HIGH-TECH SCIENCE CORPORATION
- Current Assignee: HITACHI HIGH-TECH SCIENCE CORPORATION
- Current Assignee Address: JP
- Agency: Adams & Wilks
- Priority: JP2014-009915 20140122; JP2015-007781 20150119
- Main IPC: H01J37/26
- IPC: H01J37/26 ; G21K5/04 ; H01J37/20 ; H01J37/28 ; H01J37/305

Abstract:
A charged particle beam apparatus includes an electron beam column and an FIB column, in which an irradiation axis of the electron beam column and an irradiation axis of the FIB column are disposed to be perpendicular or substantially perpendicular to each other on a sample without interference. In addition, the first sample stage and a second sample stage are independently provided and moved to be tilted centering on an axial direction. The sample is moved by the first sample stage and a sample piece which is cut off from the sample is moved to be fixed to a tip end of a probe which is rotatable centering on the axial direction, thereby manufacturing the sample piece which reduces the influence of a curtaining effect.
Public/Granted literature
- US20150206706A1 CHARGED PARTICLE BEAM APPARATUS AND SAMPLE OBSERVATION METHOD Public/Granted day:2015-07-23
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