Invention Grant
- Patent Title: Method of forming metallic pattern on polymer substrate
- Patent Title (中): 在聚合物基材上形成金属图案的方法
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Application No.: US14304982Application Date: 2014-06-16
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Publication No.: US09462699B2Publication Date: 2016-10-04
- Inventor: Babak Radi , Yu-Fu Kuo
- Applicant: Wistron NeWeb Corp.
- Applicant Address: TW Hsinchu
- Assignee: Wistron NeWeb Corp.
- Current Assignee: Wistron NeWeb Corp.
- Current Assignee Address: TW Hsinchu
- Agency: Jianq Chyun IP Office
- Main IPC: H05K3/02
- IPC: H05K3/02 ; H05K3/10 ; H05K3/18 ; H04M1/02 ; H05K1/02 ; H05K1/16 ; H05K3/00 ; H05K1/03

Abstract:
A method of forming a metallic pattern on a polymer substrate is provided. A mixture layer is formed on a polymer substrate surface. The mixture layer includes an active carrier medium and nanoparticles dispersed in the active carrier medium. A laser process is performed to treat a portion of the mixture layer to form active seed residues on the surface of the polymer substrate. A cleaning process is performed to remove an untreated portion of the mixture layer to expose the surface of the polymer substrate, while the active seed residues are remained on the surface of the polymer substrate. Then, the active seed residues on the polymer substrate are subjected to an electroless plating process to form the metallic pattern over the active seed residues on the polymer substrate.
Public/Granted literature
- US20150366072A1 METHOD OF FORMING METALLIC PATTERN ON POLYMER SUBSTRATE Public/Granted day:2015-12-17
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