Invention Grant
- Patent Title: Method for producing gas barrier film
- Patent Title (中): 阻气膜的制造方法
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Application No.: US14398580Application Date: 2013-04-30
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Publication No.: US09481010B2Publication Date: 2016-11-01
- Inventor: Kazutoshi Murota
- Applicant: Konica Minolta, Inc.
- Applicant Address: JP Tokyo
- Assignee: KONICA MINOLTA, INC.
- Current Assignee: KONICA MINOLTA, INC.
- Current Assignee Address: JP Tokyo
- Agency: Lucas & Mercanti, LLP
- Priority: JP2012-108857 20120510
- International Application: PCT/JP2013/062662 WO 20130430
- International Announcement: WO2013/168647 WO 20131114
- Main IPC: B05D3/00
- IPC: B05D3/00 ; C08J7/04 ; B32B37/24 ; C08J7/12 ; B05D3/06 ; B05D3/04 ; B05D5/00 ; C09D183/16 ; B32B38/00 ; C08G77/62
Abstract:
Provided is a method for producing a gas barrier film having a base and a gas barrier layer being arranged on the base, containing a step (1) for preparing a base having a moisture content of 0.01 to 1% by mass, a step (2) for obtaining a coating film by coating a coating liquid containing polysilazane onto the base, and a step (3) for forming a gas barrier layer by irradiating the coating film with vacuum ultraviolet rays.
Public/Granted literature
- US20150111046A1 METHOD FOR PRODUCING GAS BARRIER FILM Public/Granted day:2015-04-23
Information query
