Invention Grant
- Patent Title: Mask blank glass substrate, multilayer reflective film coated substrate, mask blank, mask, and methods of manufacturing the same
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Application No.: US14919994Application Date: 2015-10-22
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Publication No.: US09488904B2Publication Date: 2016-11-08
- Inventor: Toshihiko Orihara , Akihiro Kawahara , Tsutomu Shoki
- Applicant: HOYA CORPORATION
- Applicant Address: JP Tokyo
- Assignee: HOYA CORPORATION
- Current Assignee: HOYA CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2011-212207 20110928; JP2012-170911 20120801
- Main IPC: G03F1/24
- IPC: G03F1/24 ; G03F1/38 ; G03F1/60

Abstract:
Provided is a mask blank glass substrate that has high surface smoothness, that is formed with a fiducial mark capable of improving the detection accuracy of a defect position or the like, and that enables reuse or recycling of a glass substrate included therein. An underlayer is formed on a main surface, on the side where a transfer pattern is to be formed, of a glass substrate for a mask blank. The underlayer serves to reduce surface roughness of the main surface of the glass substrate or to reduce defects of the main surface of the glass substrate. A surface of the underlayer is a precision-polished surface. A fiducial mark which provides a reference for a defect position in defect information is formed on the underlayer.
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