Mask blank glass substrate, multilayer reflective film coated substrate, mask blank, mask, and methods of manufacturing the same
    2.
    发明授权
    Mask blank glass substrate, multilayer reflective film coated substrate, mask blank, mask, and methods of manufacturing the same 有权
    掩模坯玻璃基板,多层反射膜涂布基板,掩模板,掩模及其制造方法

    公开(公告)号:US09195131B2

    公开(公告)日:2015-11-24

    申请号:US13630622

    申请日:2012-09-28

    CPC classification number: G03F1/24 G03F1/38 G03F1/60

    Abstract: Provided is a mask blank glass substrate that has high surface smoothness, that is formed with a fiducial mark capable of improving the detection accuracy of a defect position or the like, and that enables reuse or recycling of a glass substrate included therein. An underlayer is formed on a main surface, on the side where a transfer pattern is to be formed, of a glass substrate for a mask blank. The underlayer serves to reduce surface roughness of the main surface of the glass substrate or to reduce defects of the main surface of the glass substrate. A surface of the underlayer is a precision-polished surface. A fiducial mark which provides a reference for a defect position in defect information is formed on the underlayer.

    Abstract translation: 提供了具有高表面平滑度的掩模坯料玻璃基板,其形成有能够提高缺陷位置等的检测精度的基准标记,并且能够重复利用或再循环包含在其中的玻璃基板。 在掩模坯料用玻璃基板的主表面上形成有转印图案的一侧的底层形成。 底层用于降低玻璃基板的主表面的表面粗糙度或减少玻璃基板的主表面的缺陷。 底层的表面是精密抛光的表面。 在缺陷信息中提供缺陷位置的基准的基准标记形成在底层上。

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