Invention Grant
- Patent Title: Transparent resin plate and a method for producing the same
- Patent Title (中): 透明树脂板及其制造方法
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Application No.: US12311997Application Date: 2008-12-10
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Publication No.: US09533327B2Publication Date: 2017-01-03
- Inventor: Sadao Maeda
- Applicant: Sadao Maeda
- Applicant Address: JP
- Assignee: KABUSHIKI KAISHA RENIASU
- Current Assignee: KABUSHIKI KAISHA RENIASU
- Current Assignee Address: JP
- Agency: Merek, Blackmon & Voorhees, LLC
- Priority: JP2008-053412 20080304
- International Application: PCT/JP2008/072386 WO 20081210
- International Announcement: WO2009/110152 WO 20090911
- Main IPC: B32B27/06
- IPC: B32B27/06 ; B05D3/06 ; B05D7/04 ; B05D7/00

Abstract:
A transparent resin plate superior in quality and productivity and a method for producing the same by forming a hard-coat layer on a substrate into a hardened film and by establishing a reforming method thereof are disclosed. The transparent resin plate has a substrate (1), a primer layer (2) and a hard-coating layer (3) in order, wherein the primer layer (2) is formed by a wet method, the hard-coating layer (3) is formed out of silicone polymer by the wet method, the surface of the silicone polymer layer is exposed to irradiation by ultraviolet light having a wavelength less than 200 nm, and only the exposed region is changed into a reformed region mainly composed of silicon dioxide.
Public/Granted literature
- US20100304133A1 Transparent resin plate and a method for producing the same Public/Granted day:2010-12-02
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