Invention Grant
- Patent Title: Charged particle beam generating apparatus, charged particle beam apparatus, high voltage generating apparatus, and high potential apparatus
- Patent Title (中): 带电粒子束产生装置,带电粒子束装置,高压发生装置和高电位装置
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Application No.: US14406909Application Date: 2013-05-08
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Publication No.: US09548182B2Publication Date: 2017-01-17
- Inventor: Takashi Onishi , Shunichi Watanabe , Minoru Kaneda
- Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Mattingly & Malur, PC
- Priority: JP2012-132103 20120611
- International Application: PCT/JP2013/062896 WO 20130508
- International Announcement: WO2013/187155 WO 20131219
- Main IPC: H01J37/04
- IPC: H01J37/04 ; H01J37/073 ; H01J37/02 ; H01J37/067 ; H01J37/248 ; H01J37/24 ; H01J27/02 ; H01J29/48 ; H01J37/16

Abstract:
An instrument producing a charged particle beam according to the present invention is provided with: a charged particle source; a plurality of first electrodes disposed along a direction of irradiation of charged particles from the charged particle source; a plurality of insulation members disposed between the first electrodes; and a housing mounted around the plurality of first electrodes. The housing is formed from an insulating solid material, and includes a plurality of second electrodes disposed at positions in proximity to the plurality of first electrodes. At least one of the plurality of second electrodes is electrically connected to at least one of the plurality of first electrodes, each of the plurality of second electrodes having the same potential as the potential of the proximate one of the first electrodes.
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