Invention Grant
- Patent Title: Hardmask
- Patent Title (中): 硬掩模
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Application No.: US14925147Application Date: 2015-10-28
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Publication No.: US09563126B2Publication Date: 2017-02-07
- Inventor: Shintaro Yamada , Deyan Wang , Sabrina Wong , Cong Liu , Cheng-Bai Xu
- Applicant: Rohm and Haas Electronic Materials LLC
- Applicant Address: US MA Marlborough
- Assignee: Rohm and Haas Electronic Materials LLC
- Current Assignee: Rohm and Haas Electronic Materials LLC
- Current Assignee Address: US MA Marlborough
- Agent S. Matthew Cairns
- Main IPC: G03F7/09
- IPC: G03F7/09 ; G03F7/20 ; G03F7/30 ; G03F7/36 ; G03F7/40 ; G03F7/16 ; C09B57/10 ; C09B69/10 ; C08G79/00 ; C08K5/00 ; C08K5/56 ; H01L21/027 ; H01L21/033
Abstract:
This invention provides a composition containing an organometallic compound having a chromophore moiety in the metal polymer backbone which allows a wider range of n/k values such that substrate reflectivity can be controlled under various conditions.
Public/Granted literature
- US20160048077A1 HARDMASK Public/Granted day:2016-02-18
Information query
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