Invention Grant
- Patent Title: Electron beam plasma source with remote radical source
- Patent Title (中): 具有远程自由基源的电子束等离子体源
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Application No.: US14307945Application Date: 2014-06-18
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Publication No.: US09564297B2Publication Date: 2017-02-07
- Inventor: Ming-Feng Wu , Leonid Dorf , Shahid Rauf , Ying Zhang , Kenneth S. Collins , Hamid Tavassoli , Kartik Ramaswamy , Steven Lane
- Applicant: APPLIED MATERIALS, INC.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agent Robert M. Wallace
- Main IPC: H01J37/32
- IPC: H01J37/32
Abstract:
In a plasma reactor for processing a workpiece, an electron beam is employed as the plasma source, and a remote radical source is incorporated with the process chamber.
Public/Granted literature
- US20140339980A1 ELECTRON BEAM PLASMA SOURCE WITH REMOTE RADICAL SOURCE Public/Granted day:2014-11-20
Information query
