Invention Grant
- Patent Title: Vertical gate NAND memory devices
- Patent Title (中): 垂直门NAND存储器件
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Application No.: US14314622Application Date: 2014-06-25
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Publication No.: US09570459B2Publication Date: 2017-02-14
- Inventor: Bruce Lynn Bateman
- Applicant: Unity Semiconductor Corporation
- Applicant Address: US CA Sunnyvale
- Assignee: UNITY SEMICONDUCTOR CORPORATION
- Current Assignee: UNITY SEMICONDUCTOR CORPORATION
- Current Assignee Address: US CA Sunnyvale
- Agency: Lowenstein Sandler LLP
- Main IPC: H01L29/76
- IPC: H01L29/76 ; H01L27/115 ; H01L29/66 ; H01L29/792 ; G11C16/04 ; G11C16/34

Abstract:
In an example, a device comprises a vertical stack of memory cells. Each memory cell of the vertical stack may include more than one memory element. A first vertical gate line may be coupled to a first one of the memory elements in each memory cell, and a second vertical gate line may be coupled to a second one of the memory elements in each memory cell. The first vertical gate line may be electrically isolated from the second vertical gate line.
Public/Granted literature
- US20150014760A1 VERTICAL GATE NAND MEMORY DEVICES Public/Granted day:2015-01-15
Information query
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