Invention Grant
- Patent Title: Multipole lens and charged particle beam system
- Patent Title (中): 多极透镜和带电粒子束系统
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Application No.: US15000134Application Date: 2016-01-19
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Publication No.: US09576768B2Publication Date: 2017-02-21
- Inventor: Yuji Kohno
- Applicant: JEOL Ltd.
- Applicant Address: JP Tokyo
- Assignee: JEOL Ltd.
- Current Assignee: JEOL Ltd.
- Current Assignee Address: JP Tokyo
- Agency: The Webb Law Firm
- Priority: JP2015-8293 20150120
- Main IPC: H01J37/141
- IPC: H01J37/141

Abstract:
A multipole lens is provided which is for use in electron microscopy and which is simple in structure but capable of producing X- and Y-components of a quadrupole field and X- and Y-components of an octopole field. The multipole lens (100) comprises: first through twelfth polar elements (10-1 to 10-12); first through sixteenth coils (20-1 to 20-16); a first power supply (30-1) for supplying currents to the coils (20-1, 20-4, 20-9, 20-12); a second power supply (30-2) for supplying currents to the coils (20-3, 20-5, 20-11, 20-13); a third power supply (30-3) for supplying excitation currents to the coils (20-6, 20-8, 20-14, 20-16); and a fourth power supply (30-4) for supplying excitation currents to the coils (20-2, 20-7, 20-10, 20-15). The coils (20-1, 20-3, 20-6, 20-7, 20-9, 20-11, 20-14, 20-15) produce magnetic fields in a first direction. The coils (20-2, 20-4, 20-5, 20-8, 20-10, 20-12, 20-13, 20-16) produce magnetic fields in a direction opposite to the first direction.
Public/Granted literature
- US20160225576A1 Multipole Lens and Charged Particle Beam System Public/Granted day:2016-08-04
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