Invention Grant
US09576768B2 Multipole lens and charged particle beam system 有权
多极透镜和带电粒子束系统

  • Patent Title: Multipole lens and charged particle beam system
  • Patent Title (中): 多极透镜和带电粒子束系统
  • Application No.: US15000134
    Application Date: 2016-01-19
  • Publication No.: US09576768B2
    Publication Date: 2017-02-21
  • Inventor: Yuji Kohno
  • Applicant: JEOL Ltd.
  • Applicant Address: JP Tokyo
  • Assignee: JEOL Ltd.
  • Current Assignee: JEOL Ltd.
  • Current Assignee Address: JP Tokyo
  • Agency: The Webb Law Firm
  • Priority: JP2015-8293 20150120
  • Main IPC: H01J37/141
  • IPC: H01J37/141
Multipole lens and charged particle beam system
Abstract:
A multipole lens is provided which is for use in electron microscopy and which is simple in structure but capable of producing X- and Y-components of a quadrupole field and X- and Y-components of an octopole field. The multipole lens (100) comprises: first through twelfth polar elements (10-1 to 10-12); first through sixteenth coils (20-1 to 20-16); a first power supply (30-1) for supplying currents to the coils (20-1, 20-4, 20-9, 20-12); a second power supply (30-2) for supplying currents to the coils (20-3, 20-5, 20-11, 20-13); a third power supply (30-3) for supplying excitation currents to the coils (20-6, 20-8, 20-14, 20-16); and a fourth power supply (30-4) for supplying excitation currents to the coils (20-2, 20-7, 20-10, 20-15). The coils (20-1, 20-3, 20-6, 20-7, 20-9, 20-11, 20-14, 20-15) produce magnetic fields in a first direction. The coils (20-2, 20-4, 20-5, 20-8, 20-10, 20-12, 20-13, 20-16) produce magnetic fields in a direction opposite to the first direction.
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