Invention Grant
- Patent Title: Positive photosensitive composition, thin film transistor, and compound
- Patent Title (中): 正光敏组合物，薄膜晶体管和化合物
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Application No.: US15288722Application Date: 2016-10-07
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Publication No.: US09588425B2Publication Date: 2017-03-07
- Inventor: Masahito Ide , Hirofumi Inari , Aki Kitajima , Komei Tahara , Takao Manabe
- Applicant: KANEKA CORPORATION
- Applicant Address: JP Osaka
- Assignee: Kaneka Corporation
- Current Assignee: Kaneka Corporation
- Current Assignee Address: JP Osaka
- Agency: Hamre, Schumann, Mueller & Larson, P.C.
- Priority: JP2012-150354 20120704; JP2012-230873 20121018; JP2012-272734 20121213; JP2012-282900 20121226; JP2013-063936 20130326
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/075 ; H01L29/51 ; H01L29/423 ; C07F7/18 ; G03F7/16 ; G03F7/20 ; G03F7/32 ; G03F7/40 ; H01L29/786 ; H01L29/66 ; H01L21/441 ; H01L23/29 ; H01L21/033 ; G03F7/039 ; H01L51/05 ; H01L51/00 ; G03F7/027 ; H01L21/02 ; C08G77/388 ; C08K5/549
Abstract:
The present invention aims to provide positive photosensitive compositions that have excellent patterning properties and can exhibit excellent electrical insulation reliability when cured (as thin films). The positive photosensitive composition according to a first aspect of the present invention is characterized by including (A) a compound that contains an alkenyl group or a SiH group within a molecule and has a structure that decomposes in the presence of acid to generate an acidic group or a hydroxyl group; (B) a compound that contains a SiH group or an alkenyl group within a molecule; (C) a hydrosilylation catalyst; and (D) a photoacid generator.
Public/Granted literature
- US20170023861A1 POSITIVE PHOTOSENSITIVE COMPOSITION, THIN FILM TRANSISTOR, AND COMPOUND Public/Granted day:2017-01-26
Information query
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