Invention Grant
- Patent Title: Quantitative analysis method for measuring target element in specimen using laser-induced plasma spectrum
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Application No.: US14104888Application Date: 2013-12-12
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Publication No.: US09606065B2Publication Date: 2017-03-28
- Inventor: Sungho Jeong , Jeonghwan In , Chan Kyu Kim , Seokhee Lee
- Applicant: GWANGJU INSTITUTE OF SCIENCE AND TECHNOLOGY
- Applicant Address: KR Gwangju
- Assignee: GWANGJU INSTITUTE OF SCIENCE AND TECHNOLOGY
- Current Assignee: GWANGJU INSTITUTE OF SCIENCE AND TECHNOLOGY
- Current Assignee Address: KR Gwangju
- Agency: Hauptman Ham, LLP
- Priority: KR10-2012-0145150 20121213
- Main IPC: G01N21/71
- IPC: G01N21/71 ; G01J3/443 ; G01J3/28

Abstract:
Disclosed herein is a quantitative analysis method for measuring a target element in a specimen using laser-induced plasma spectrum. More particularly, the present invention relates to a method for analyzing a composition ratio of a target element by calculating peak intensities when peaks overlap each other in a spectrum, and a method for selecting a peak of a wavelength at which the highest precision and reproducibility are secured through linearity of a correlation plot of the peak intensities and a value by dividing a standard deviation value of calibration curve data (peak intensity ratios) by a slope when an internal standard method is used for quantitative analysis of a target element.
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