公开(公告)号：US09606065B2

公开(公告)日：2017-03-28

申请号：US14104888

申请日：2013-12-12

Applicant: GWANGJU INSTITUTE OF SCIENCE AND TECHNOLOGY

Inventor： Sungho Jeong ,  Jeonghwan In ,  Chan Kyu Kim ,  Seokhee Lee

IPC: G01N21/71 ,  G01J3/443 ,  G01J3/28

CPC classification number: G01N21/718 ,  G01J3/28 ,  G01J3/443

Abstract: Disclosed herein is a quantitative analysis method for measuring a target element in a specimen using laser-induced plasma spectrum. More particularly, the present invention relates to a method for analyzing a composition ratio of a target element by calculating peak intensities when peaks overlap each other in a spectrum, and a method for selecting a peak of a wavelength at which the highest precision and reproducibility are secured through linearity of a correlation plot of the peak intensities and a value by dividing a standard deviation value of calibration curve data (peak intensity ratios) by a slope when an internal standard method is used for quantitative analysis of a target element.