Invention Grant
- Patent Title: Block copolymer self-assembly for pattern density multiplication and rectification
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Application No.: US14588865Application Date: 2015-01-02
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Publication No.: US09626996B2Publication Date: 2017-04-18
- Inventor: XiaoMin Yang , Zhaoning Yu , Kim Yang Lee , Michael Feldbaum , Yautzong Hsu , Wei Hu , Shuaigang Xiao , Henry Yang , HongYing Wang , Rene Johannes Marinus van de Veerdonk , David Kuo
- Applicant: Seagate Technology LLC
- Applicant Address: US CA Cupertino
- Assignee: Seagate Technologies LLC
- Current Assignee: Seagate Technologies LLC
- Current Assignee Address: US CA Cupertino
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G11B5/855 ; H01L21/3065 ; G03F7/40 ; H01L21/027 ; G03F7/20 ; H01L21/02 ; B82Y10/00 ; B82Y40/00 ; G03F7/00 ; B81C1/00 ; B32B27/36 ; B32B27/28 ; B32B27/30 ; B32B3/30 ; G03F7/16 ; B05D1/00 ; C23F4/00

Abstract:
Provided herein is a method, including a) transferring an initial pattern of an initial template to a substrate; b) performing block copolymer self-assembly over the substrate with a density multiplication factor k; c) creating a subsequent pattern in a subsequent template with the density multiplication factor k; and d) repeating steps a)-c) with the subsequent template as the initial template until a design specification for the subsequent pattern with respect to pattern density and pattern resolution is met.
Public/Granted literature
- US20150118625A1 BLOCK COPOLYMER SELF-ASSEMBLY FOR PATTERN DENSITY MULTIPLICATION AND RECTIFICATION Public/Granted day:2015-04-30
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