Invention Grant
- Patent Title: Method for fabricating semiconductor device
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Application No.: US14884746Application Date: 2015-10-15
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Publication No.: US09627268B2Publication Date: 2017-04-18
- Inventor: Ching-Yu Chang , Li-Wei Feng , Shih-Hung Tsai , Ssu-I Fu , Jyh-Shyang Jenq , Chien-Ting Lin , Yi-Ren Chen , Shou-Wei Hsieh , Hsin-Yu Chen , Chun-Hao Lin
- Applicant: UNITED MICROELECTRONICS CORP.
- Applicant Address: TW Hsin-Chu
- Assignee: UNITED MICROELECTRONICS CORP.
- Current Assignee: UNITED MICROELECTRONICS CORP.
- Current Assignee Address: TW Hsin-Chu
- Agent Winston Hsu; Scott Margo
- Priority: TW104129113A 20150903
- Main IPC: H01L21/8238
- IPC: H01L21/8238 ; H01L21/324

Abstract:
A method for fabricating semiconductor device is disclosed. The method includes the steps of: providing a substrate having a fin-shaped structure thereon and a shallow trench isolation (STI) around the fin-shaped structure, in which the fin-shaped structure has a top portion and a bottom portion; forming a first doped layer on the STI and the top portion; and performing a first anneal process.
Public/Granted literature
- US20170069543A1 METHOD FOR FABRICATING SEMICONDUCTOR DEVICE Public/Granted day:2017-03-09
Information query
IPC分类: