Invention Grant
- Patent Title: Method of forming metallic pattern on polymer substrate
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Application No.: US14316809Application Date: 2014-06-27
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Publication No.: US09657404B2Publication Date: 2017-05-23
- Inventor: Babak Radi , Shih-Hong Chen , Yu-Fu Kuo , Tzu-Wen Chuang
- Applicant: Wistron NeWeb Corp.
- Applicant Address: TW Hsinchu
- Assignee: Wistron NeWeb Corp.
- Current Assignee: Wistron NeWeb Corp.
- Current Assignee Address: TW Hsinchu
- Agency: Jianq Chyun IP Office
- Main IPC: H05K3/10
- IPC: H05K3/10 ; C25D5/02 ; C25D5/56 ; H05K3/24

Abstract:
A method of forming a metallic pattern on a polymer substrate is provided. A mixture layer is formed on a polymer substrate surface. The mixture layer includes an active carrier medium and nanoparticles dispersed in the active carrier medium. A laser process is performed to treat a portion of the mixture layer to form a conductive pattern on the surface of the polymer substrate. A cleaning process is performed to remove an untreated portion of the mixture layer to expose the surface of the polymer substrate, while the conductive pattern is remained on the surface of the polymer substrate. Then, the conductive pattern on the polymer substrate is subjected to an electroplating process to form the metallic pattern over the conductive pattern on the polymer substrate.
Public/Granted literature
- US20150376809A1 METHOD OF FORMING METALLIC PATTERN ON POLYMER SUBSTRATE Public/Granted day:2015-12-31
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