Invention Grant
- Patent Title: Inspection of substrates using calibration and imaging
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Application No.: US14432045Application Date: 2013-09-27
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Publication No.: US09664625B2Publication Date: 2017-05-30
- Inventor: Wei Zhou
- Applicant: RUDOLPH TECHNOLOGIES, INC.
- Applicant Address: US MA Wilmington
- Assignee: Rudolph Technologies, Inc.
- Current Assignee: Rudolph Technologies, Inc.
- Current Assignee Address: US MA Wilmington
- Agency: Dicke, Billig & Czaja, PLLC
- International Application: PCT/US2013/062272 WO 20130927
- International Announcement: WO2014/052811 WO 20140403
- Main IPC: G01N21/00
- IPC: G01N21/00 ; G01N21/88 ; G01N21/95 ; G01N21/956 ; G01B11/02 ; G01B11/06

Abstract:
An inspection system is disclosed. An optical assembly establishes an optical path between a light source and a detector. The optical assembly has a relatively large amount of longitudinal chromatic aberration, so that light at a first wavelength focuses on one region of a substrate in the optical path, while light at a second wavelength simultaneously focuses on another region of the substrate. The system can operate in a calibration mode to determine one or more wavelengths of light corresponding to regions of interest in the substrate and in an imaging mode to image regions of interest in the substrate.
Public/Granted literature
- US20150253256A1 INSPECTION OF SUBSTRATES USING CALIBRATION AND IMAGING Public/Granted day:2015-09-10
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