- Patent Title: Method of manufacturing transparent conductive film, the transparent conductive film, element and transparent conductive substrate using the film, as well as device using the substrate
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Application No.: US13579380Application Date: 2011-02-15
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Publication No.: US09701849B2Publication Date: 2017-07-11
- Inventor: Masaya Yukinobu , Takahito Nagano , Yoshihiro Otsuka
- Applicant: Masaya Yukinobu , Takahito Nagano , Yoshihiro Otsuka
- Applicant Address: JP Tokyo
- Assignee: SUMITOMO METAL MINING CO., LTD.
- Current Assignee: SUMITOMO METAL MINING CO., LTD.
- Current Assignee Address: JP Tokyo
- Agent Gerald E. Hespos; Michael J. Porco; Matthew T. Hespos
- Priority: JP2010-032426 20100217; JP2010-131190 20100608
- International Application: PCT/JP2011/053171 WO 20110215
- International Announcement: WO2011/102350 WO 20110825
- Main IPC: B05D3/06
- IPC: B05D3/06 ; B05D3/04 ; B05D5/06 ; B05D5/12 ; C09D5/24 ; C23C18/14 ; H01L31/18 ; C23C18/12 ; C09D11/101
Abstract:
By using a coating method, which is a simple method of manufacturing a transparent conductive film at low cost, a transparent conductive film formed with heating at a low temperature, in particular, lower than 300° C. with both of excellent transparency and conductivity and also with excellent film strength and a method of manufacturing this transparent conductive film are provided.
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