Invention Grant
- Patent Title: Laser chamber
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Application No.: US15198433Application Date: 2016-06-30
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Publication No.: US09722385B2Publication Date: 2017-08-01
- Inventor: Hiroyuki Ikeda , Kouji Kakizaki , Hiroaki Tsushima , Hisakazu Katsuumi
- Applicant: Gigaphoton Inc.
- Applicant Address: JP Tochigi
- Assignee: Gigaphoton Inc.
- Current Assignee: Gigaphoton Inc.
- Current Assignee Address: JP Tochigi
- Agency: Studebaker & Brackett PC
- Priority: WOPCT/JP2014/054230 20140221
- Main IPC: H01S3/038
- IPC: H01S3/038 ; H01S3/097 ; H01S3/225 ; H01S3/036 ; H01S3/03 ; H01S3/134

Abstract:
A laser chamber for a discharge excited gas laser apparatus may include: a first discharge electrode disposed in the laser chamber; a second discharge electrode disposed to face the first discharge electrode in the laser chamber; a fan configured to flow laser gas between the first discharge electrode and the second discharge electrode; a first insulating member disposed upstream and downstream of a laser gas flow from the first discharge electrode; a metallic damper member disposed upstream of the laser gas flow from the second discharge electrode; and a second insulating member disposed downstream of the laser gas flow from the second discharge electrode.
Public/Granted literature
- US20160308324A1 LASER CHAMBER Public/Granted day:2016-10-20
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