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    Laser apparatus
    4.
    发明授权
    Laser apparatus 有权

    公开(公告)号：US09601893B2

    公开(公告)日：2017-03-21

    申请号：US15060148

    申请日：2016-03-03

    Applicant: GIGAPHOTON INC.

    Inventor： Kouji Kakizaki ,  Takeshi Asayama ,  Osamu Wakabayashi

    IPC: H01S3/038 ,  H01S3/134 ,  H01S3/225 ,  H01S3/08

    CPC classification number: H01S3/038 ,  H01S3/08009 ,  H01S3/134 ,  H01S3/225

    Abstract: There may be provided a laser apparatus including: an optical resonator including an output coupler; a laser chamber containing a laser medium and disposed in an optical path inside the optical resonator; a pair of discharge electrodes disposed inside the laser chamber; an electrode gap varying section configured to vary a gap between the discharge electrodes; a laser beam measurement section disposed in an optical path of a laser beam outputted from the output coupler, the laser beam resulting from electric discharge between the discharge electrodes; and a controller configured to control the gap between the discharge electrodes through activating the electrode gap varying section, based on a beam parameter of the laser beam measured by the laser beam measurement section.

    Extreme ultraviolet light source apparatus
    5.
    发明授权
    Extreme ultraviolet light source apparatus 有权

    公开(公告)号：US09429847B2

    公开(公告)日：2016-08-30

    申请号：US15064019

    申请日：2016-03-08

    Applicant: Gigaphoton Inc.

    Inventor： Toshihiro Nishisaka ,  Yukio Watanabe ,  Osamu Wakabayashi ,  Kouji Kakizaki ,  Michio Shinozaki

    IPC: H05G2/00 ,  G03F7/20

    CPC classification number: G03F7/70033 ,  G03F7/70975 ,  H05G2/00 ,  H05G2/003 ,  H05G2/008

    Abstract: An EUV light source apparatus by which detachment of a chamber or a part of the chamber, movement to a maintenance area, and highly accurate placement relative to projection optics can be performed easily for maintenance of the EUV light source apparatus. The EUV light source apparatus is an apparatus for generating plasma by applying a laser beam to a target material within a chamber and entering EUV light radiated from the plasma into projection optics of exposure equipment, and includes a positioning mechanism for positioning the chamber or a maintenance unit of the chamber in a predetermined location where an optical axis of the collected extreme ultraviolet light and an optical axis of the projection optics of the exposure equipment are aligned, and a movement mechanism for moving the chamber or the maintenance unit of the chamber between the predetermined location and a maintenance area.

    Laser processing system and laser processing method
    7.
    发明授权
    Laser processing system and laser processing method 有权

    公开(公告)号：US11465233B2

    公开(公告)日：2022-10-11

    申请号：US16378102

    申请日：2019-04-08

    Applicant: Gigaphoton Inc.

    Inventor： Kouji Kakizaki ,  Osamu Wakabayashi

    IPC: B23K26/06 ,  B23K26/0622 ,  B23K26/064 ,  B23K26/03 ,  B23K26/08 ,  B23K26/12 ,  B23K26/16 ,  B23K26/362 ,  B23K26/40 ,  H01S3/13 ,  H01S3/225 ,  H01S3/23 ,  B23K26/14 ,  B23K103/00 ,  B23K101/40

    Abstract: A laser processing system includes: a wavelength-variable laser device configured to output each of a laser beam at an absorption line as a wavelength at which light is absorbed by oxygen and a laser beam at a non-absorption line as a wavelength at which the amount of light absorption by oxygen is smaller than at the absorption line; an optical system configured to irradiate a workpiece with the laser beam; and a laser control unit configured to control the wavelength-variable laser device, set the wavelength of the laser beam output from the wavelength-variable laser device to be the non-absorption line when laser processing is performed on the surface of the workpiece in gas containing oxygen, and set the wavelength of the laser beam output from the wavelength-variable laser device to be the absorption line when ozone cleaning is performed on the surface of the workpiece in gas containing oxygen.

    Laser device and electronic device manufacturing method
    9.
    发明授权
    Laser device and electronic device manufacturing method 有权

    公开(公告)号：US12113326B2

    公开(公告)日：2024-10-08

    申请号：US17817839

    申请日：2022-08-05

    Applicant: Gigaphoton Inc.

    Inventor： Yoichi Sasaki ,  Kouji Kakizaki ,  Hakaru Mizoguchi

    IPC: H01S3/036 ,  G03F7/20 ,  H01S3/038

    CPC classification number: H01S3/036 ,  G03F7/2006 ,  H01S3/038

    Abstract: A laser device according to an aspect of the present disclosure includes a chamber into which laser gas is introduced; a pair of electrodes arranged in the chamber; a power source configured to apply a voltage between the electrodes; a nozzle structure which includes an internal passage for receiving the laser gas and a slit connected to the internal passage and is configured to generate flow of the laser gas between the electrodes due to the laser gas blowing out from the slit; a gas flow path which has a suction port through which the laser gas in the chamber is suctioned and introduces, to the nozzle structure, the laser gas suctioned through the suction port; and a blower device configured to cause the laser gas to blow toward the internal passage of the nozzle structure through the gas flow path.

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