Invention Grant
- Patent Title: Charged particle beam device
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Application No.: US14762621Application Date: 2014-02-05
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Publication No.: US09786468B2Publication Date: 2017-10-10
- Inventor: Toshiyuki Yokosuka , Chahn Lee , Hideyuki Kazumi
- Applicant: Hitachi High-Technologies Corporation
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Crowell & Moring LLP
- Priority: JP2013-035288 20130226
- International Application: PCT/JP2014/052609 WO 20140205
- International Announcement: WO2014/132757 WO 20140904
- Main IPC: H01J37/147
- IPC: H01J37/147 ; H01J37/22 ; H01J37/244 ; H01J37/28

Abstract:
An object of the invention is to provide a charged particle beam apparatus capable of performing high-precision measurement even on a pattern in which a width of edges is narrow and inherent peaks of the edges cannot be easily detected. In order to achieve the above object, there is proposed a charged particle beam apparatus including an opening portion forming member having a passage opening of a charged particle beam and a detector for detecting charged particles emitted from a sample or charged particles generated by causing the charged particles to collide with the opening portion forming member, the charged particle beam apparatus including: a deflector for deflecting the charged particles emitted from the sample; and a control device for controlling the deflector, the control device performing pattern measurement with the use of a first detected signal in which a signal of one edge is emphasized relatively more than a signal of another edge among a plurality of edges on the sample and a second detected signal in which the signal of the another edge is emphasized relatively more than the signal of the one edge among the plurality of edges.
Public/Granted literature
- US20150357154A1 Charged Particle Beam Device Public/Granted day:2015-12-10
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