- Patent Title: Method for etching metal or metal oxide by ozone water, method for smoothing surface of metal or metal oxide by ozone water, and patterning method using ozone water
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Application No.: US14396462Application Date: 2013-04-25
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Publication No.: US09797046B2Publication Date: 2017-10-24
- Inventor: Takatoki Yamamoto , Ryuji Hatsuki
- Applicant: Japan Science and Technology Agency
- Applicant Address: JP Kawaguchi-Shi
- Assignee: JAPAN SCIENCE AND TECHNOLOGY AGENCY
- Current Assignee: JAPAN SCIENCE AND TECHNOLOGY AGENCY
- Current Assignee Address: JP Kawaguchi-Shi
- Priority: JP2012-103285 20120427
- International Application: PCT/JP2013/062261 WO 20130425
- International Announcement: WO2013/161959 WO 20131031
- Main IPC: H01L21/302
- IPC: H01L21/302 ; C23F1/02 ; H01L21/3213 ; C09K13/00 ; C23F1/16 ; C23F3/03 ; C23F3/06
Abstract:
Provided are a method for etching a metal or metal oxide without using a reagent, etc., that affects the environment, a method for smoothing a surface of a metal or metal oxide on an atomic level, and a method for patterning on an atomic level. Etching of a metal or metal oxide, or smoothing of a surface of a metal or metal oxide is possible using ozone water in which only ozone is dissolved. Patterning can also be performed by providing a metal that does not dissolve in the ozone water as a resist on a metal or metal oxide that can be etched by ozone water in which only ozone is dissolved, and etching using the ozone water.
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