Invention Grant
- Patent Title: Surface processing apparatus
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Application No.: US14747488Application Date: 2015-06-23
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Publication No.: US09852878B2Publication Date: 2017-12-26
- Inventor: Masahiro Hatakeyama , Kenichi Suematsu , Ryo Tajima , Kiwamu Tsukamoto , Kenji Terao , Shoji Yoshikawa
- Applicant: EBARA CORPORATION
- Applicant Address: JP Tokyo
- Assignee: EBARA CORPORATION
- Current Assignee: EBARA CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Pearne & Gordon LLP
- Priority: JP2014-128914 20140624; JP2015-018238 20150202
- Main IPC: H01J37/20
- IPC: H01J37/20 ; H01J37/22 ; H01J37/305 ; H01J37/30 ; H01J37/302 ; H01J37/317

Abstract:
A surface processing apparatus is an apparatus which performs surface processing on an inspection object 20 by irradiating the inspection object with an electron beam. A surface processing apparatus includes: an electron source 10 (including lens system that controls beam shape of electron beam) which generates an electron beam; a stage 30 on which an inspection object 20 to be irradiated with the electron beam is set; and an optical microscope 110 for checking a position to be irradiated with the electron beam. The current value of the electron beam which irradiates the inspection object 20 is set at 10 nA to 100 A.
Public/Granted literature
- US20150371813A1 SURFACE PROCESSING APPARATUS Public/Granted day:2015-12-24
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