Invention Grant
- Patent Title: Methods of coating surfaces using initiated plasma-enhanced chemical vapor deposition
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Application No.: US13571814Application Date: 2012-08-10
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Publication No.: US09884341B2Publication Date: 2018-02-06
- Inventor: Karen K. Gleason , Anna M. Coclite
- Applicant: Karen K. Gleason , Anna M. Coclite
- Applicant Address: US MA Cambridge
- Assignee: Massachusetts Institute of Technology
- Current Assignee: Massachusetts Institute of Technology
- Current Assignee Address: US MA Cambridge
- Agency: Foley Hoag LLP
- Main IPC: C08F2/46
- IPC: C08F2/46 ; B05D1/00 ; B05D7/00
Abstract:
Disclosed is an organic coating with a high degree of global planarization. Further disclosed is an iPECVD-based method of coating a substrate with an organic layer having a high degree of global planarization. Disclosed is a flexible, alternating organic and inorganic multi-layer coating with low water permeability, a high-degree of transparency, and a high-degree of global planarization. Also disclosed is an iPECVD-based method of coating a substrate with the alternating organic and inorganic multi-layer coating.
Public/Granted literature
- US20130040102A1 Methods of Coating Surfaces Using Initiated Plasma-Enhanced Chemical Vapor Deposition Public/Granted day:2013-02-14
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