公开(公告)号：KR1020130129851A

公开(公告)日：2013-11-29

申请号：KR1020130056697

申请日：2013-05-20

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 무라마츠마코토 ,  키타노타카히로 ,  도미타타다토시 ,  타노우치케이지

IPC: H01L21/027

CPC classification number: H01L21/0273 ,  B05C5/02 ,  B05C11/1007 ,  B05D1/40 ,  G03F7/16

Abstract: The present invention is to prevent a disordered pattern from being generated in a region where a pattern is not formed when the pattern is formed by a block copolymer on a substrate. Problems are solved by a coating device including a substrate holding part holding a substrate; a coating nozzle that is arranged in the upper region of the substrate holding part, supplies a coating solution including a block copolymer to the substrate supported by the substrate holding part, and has a coating solution path like a capillary tube and an injection hole; a transfer unit that reaches the injection hole of the coating nozzle to the substrate supported by the substrate holding part and relatively move the coating nozzle with regard to the substrate; a coating solution tank that stores the coating solution and connects the coating nozzle; a coating solution tank operation part controlling the level of the coating solution in the coating solution tank with regard to the height of the injection hole. [Reference numerals] (7) Control unit

Abstract translation: 本发明是为了防止在通过基板上的嵌段共聚物形成图案的情况下在不形成图案的区域中产生无序图案。 通过包括保持基板的基板保持部的涂布装置来解决问题; 布置在基板保持部的上部区域的涂布喷嘴，将由嵌段共聚物构成的涂布溶液供给到由基板保持部支撑的基板，并具有如毛细管和喷射孔的涂布液路径; 传送单元，其到达所述涂布喷嘴的喷射孔到由所述基板保持部支撑的所述基板，并相对于所述基板相对移动所述涂布喷嘴; 一个储存涂层溶液并连接涂层喷嘴的涂层溶液罐; 一个涂料溶液罐操作部分，用于控制涂料溶液罐中涂料溶液相对于喷射孔高度的水平。 （附图标记）（7）控制单元

公开(公告)号：KR102122343B1

公开(公告)日：2020-06-12

申请号：KR1020157019983

申请日：2014-01-22

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 무라마츠마코토 ,  키타노타카히로 ,  도미타타다토시 ,  타노우치케이지 ,  오카다소이치로

IPC: H01L21/033 ,  H01L21/67

公开(公告)号：KR1020150114476A

公开(公告)日：2015-10-12

申请号：KR1020157019983

申请日：2014-01-22

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 무라마츠마코토 ,  키타노타카히로 ,  도미타타다토시 ,  타노우치케이지 ,  오카다소이치로

IPC: H01L21/033 ,  H01L21/027 ,  H01L21/02

CPC classification number: H01L21/0337

Abstract: 본발명의기판처리방법은, 알칼리용액에가용인도포막을기판상에형성하는도포막형성공정과, 도포막상에레지스트패턴을형성하는레지스트패턴형성공정과, 레지스트패턴을마스크로서기판상에정해진패턴을형성하는패턴처리공정과, 이후, 알칼리용액에의해도포막을제거함으로써레지스트패턴을제거하는도포막제거공정과, 블록공중합체를, 도포막및 레지스트패턴제거후의기판상에도포하는블록공중합체도포공정과, 블록공중합체를, 제 1 폴리머와제 2 폴리머로상분리시키는폴리머분리공정을가진다.