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公开(公告)号：KR101184859B1
公开(公告)日：2012-09-20
申请号：KR1020110028029
申请日：2011-03-29
Applicant: 성균관대학교산학협력단
CPC classification number: H05H1/46 , H01J37/32091 , H01J37/321 , H01J37/32568 , H01J37/32825 , H05H2001/4652 , H05H2001/4675
Abstract: PURPOSE: A hybrid plasma source and a plasma generating apparatus using the same are provided to perform low pressure processing by forming an inductively coupled inner plasma source surrounding a capacitively coupled internal plasma source. CONSTITUTION: RF power is respectively connected to a first electrode(120), a second electrode(140), and one or more unit coils(220). An electric field is induced by applying the RF power to a first electrode and a second electrode. Reaction gas is inserted through a gas inlet installed at a lateral exterior wall(160) of a plasma generating device. The reaction gas is changed into a plasma state by the electric field induced inside a second space. Unit coils receiving power from the RF power generates the electric field. The electric field is left out in the second space. The induced electric field turns gas into plasma by generating discharge in the reaction gas inserted through the gas inlet.
Abstract translation: 目的：提供一种混合等离子体源和使用其的等离子体产生装置，以通过形成围绕电容耦合的内部等离子体源的电感耦合内部等离子体源来执行低压处理。 构成：RF功率分别连接到第一电极（120），第二电极（140）和一个或多个单元线圈（220）。 通过将RF功率施加到第一电极和第二电极来感应电场。 反应气体通过安装在等离子体产生装置的侧外壁（160）处的气体入口插入。 反应气体通过在第二空间内诱发的电场而变为等离子体状态。 从RF功率接收功率的单元线圈产生电场。 电场被留在第二个空间。 感应电场通过在气体入口插入的反应气体中产生放电而将气体变成等离子体。
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公开(公告)号：KR101021480B1
公开(公告)日：2011-03-16
申请号：KR1020070126968
申请日：2007-12-07
Applicant: 성균관대학교산학협력단
Abstract: 본 발명은 페라이트 구조체를 구비하는 플라즈마 소스 및 이를 채택하는 플라즈마 발생장치에 관한 것으로, 반응챔버의 내측 상부에 형성된 제1 안테나 및 제2 안테나의 일측을 연결한 루프형 선형안테나로부터 방사형으로 형성된 필드(field)를 상기 반응챔버 내부에 안착된 처리기판 방향으로 집중시키는 페라이트 구조체를 포함하는 구성을 마련한다.
상기와 같은 페라이트 구조체를 구비하는 플라즈마 소스 및 이를 채택하는 플라즈마 발생장치를 이용하는 것에 의해, 방사형으로 형성되는 필드(field)를 처리기판으로 집중시켜 전력손실을 줄이고, 반응챔버 내부에서 플라즈마의 밀도 및 균일도를 향상시켜 반도체 제조공정의 효율성 및 수율을 높일 수 있다.
선형안테나, 플라즈마, 페라이트, 유도코일-
公开(公告)号：KR1020120060017A
公开(公告)日：2012-06-11
申请号：KR1020100121567
申请日：2010-12-01
Applicant: 성균관대학교산학협력단
CPC classification number: H05H1/46 , H01J37/3211 , H01J37/32458 , H01J37/32669 , H05H2001/4667
Abstract: PURPOSE: A plasma sources and a plasma generating apparatus including the same are provided to intensify a magnetic field induced through ferrite by mounting an arc-shaped ferrite structure on a helical antenna coil. CONSTITUTION: A plasma generating device(1) comprises a reaction chamber(10), a plasma source(20), a dielectric structure(30), and a power supply unit(40). The reaction chamber forms a reaction space for processing a substrate. A gas nozzle(11) is formed in the sidewall of the reaction chamber to let in the reaction gas from the outside. The plasma source is composed of an antenna coil(21) and a ferrite structure(23). The dielectric structure insulates the reaction chamber and the plasma source. The power supply unit is electrically connected to one end of the helical antenna coil.
Abstract translation: 目的：提供一种等离子体源和包括该等离子体源的等离子体产生装置，以通过在弧形天线线圈上安装弧形铁氧体结构来增强由铁素体引起的磁场。 构成：等离子体产生装置（1）包括反应室（10），等离子体源（20），电介质结构（30）和电源单元（40）。 反应室形成用于处理基板的反应空间。 气体喷嘴（11）形成在反应室的侧壁中以从外部引入反应气体。 等离子体源由天线线圈（21）和铁氧体结构（23）构成。 电介质结构使反应室和等离子体源绝缘。 电源单元电连接到螺旋天线线圈的一端。
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公开(公告)号：KR1020090059884A
公开(公告)日：2009-06-11
申请号：KR1020070126968
申请日：2007-12-07
Applicant: 성균관대학교산학협력단
CPC classification number: H01J37/32669 , H01J37/3211 , H01J37/32174 , H05H1/46 , H05H2001/4667
Abstract: A plasma source and a plasma generating apparatus using the same are provided to concentrate a field of a radial shape to a substrate to be treated by mounting a ferrite structure on a linear type antenna. One linear antenna(21) forms a loop type by connecting one side of a first antenna of a linear type to one side of a second antenna of a linear type. A ferrite structure(23a) is positioned in each top part of the first antenna and the second antenna of the linear antenna. The ferrite structure concentrates a field formed into a radial type from the antenna to a specific direction. The ferrite structure is formed into an arch type.
Abstract translation: 提供了一种等离子体源和使用该等离子体源的等离子体产生装置，通过将铁氧体结构安装在线性天线上将径向形状的场域集中到待处理的基板上。 一个线性天线（21）通过将线性类型的第一天线的一侧连接到线性类型的第二天线的一侧来形成环路类型。 铁氧体结构（23a）位于第一天线的每个顶部和线性天线的第二天线中。 铁氧体结构将从天线形成的径向类型的场集中到特定方向。 铁氧体结构形成拱型。
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