公开(公告)号：KR100822679B1

公开(公告)日：2008-04-17

申请号：KR1020060122003

申请日：2006-12-05

Applicant: 전남대학교산학협력단

Inventor： 채규호 ,  장영민 ,  서지영

IPC: G03F7/039

Abstract: A positive type photosensitive polyimide composition containing a photobase generator is provided to obtain a positive type photosensitive polyimide capable of minimizing generation of contaminants and preventing a drop in resolution by using a reaction development patterning process. A positive type photosensitive polyimide composition comprises: a soluble polyimide represented by the following formula 1; polyamic acid represented by the following formula 2; and a photobase generator having an oxime-urethane group represented by the following formula 3. In the formulae, n is an integer of 3-10,000; p is 0 or 1; each of P and Q represents at least one substituent selected from the group consisting of phenyl, naphthyl, pentadienyl, halogen, C1-C4 alkyl-substituted phenyl, naphthyl and pentadienyl; and B is a leaving group including a C1-C20 aromatic or aliphatic hydrocarbon compound.

Abstract translation: 提供含有光碱产生剂的正型光敏聚酰亚胺组合物，以获得通过使用反应显影图案化工艺能够最小化污染物产生并防止分辨率下降的正型光敏聚酰亚胺。 正型光敏聚酰亚胺组合物包含：由下式1表示的可溶性聚酰亚胺; 由下式2表示的聚酰胺酸; 和具有由下式3表示的肟 - 氨基甲酸酯基团的光碱产生剂。在式中，n为3-10,000的整数; p为0或1; P和Q中的每一个表示选自苯基，萘基，戊二烯基，卤素，C 1 -C 4烷基取代的苯基，萘基和戊二烯基中的至少一个取代基。 和B是包括C 1 -C 20芳族或脂族烃化合物的离去基团。