中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

3 records (took 0.016 seconds)

    미생물 점착 방지용 공중합체 수지 코팅재
    1.
    发明公开
    미생물 점착 방지용 공중합체 수지 코팅재 失效
    防霉共聚物树脂

    公开(公告)号：KR1020080017809A

    公开(公告)日：2008-02-27

    申请号：KR1020060079484

    申请日：2006-08-22

    Applicant: 전남대학교산학협력단

    Inventor： 채규호 ,  장영민 ,  이종일 ,  손옥재

    IPC: C08F222/00 ,  C08F222/02 ,  C08F222/04 ,  C08J7/04

    CPC classification number: C08F293/00 ,  C08K5/521 ,  C08L53/00 ,  C09D153/00 ,  C08L2666/02

    Abstract: A copolymer resin for preventing the adhesion of microorganism, a method for preparing the copolymer resin, a coating material containing the copolymer resin, and a method for forming a coating by using the coating material are provided to improve solvent and chemical resistance, to enhance antifouling property and to reduce shrinkage. A copolymer resin comprises a repeating unit represented by the formula 1 and a repeating unit represented by the formula 2, wherein R1 and R3 are independently a C1-C5 alkyl group; R2, R4, R5, R6, R7 and R8 are independently H or a C1-C20 alkyl group. The copolymer resin is prepared by mixing a phosphocholine derivative, glycidyl (meth)acrylate and an initiator; and stirring the mixture at 40-80 deg.C for 10-30 hours for radical polymerization.

    Abstract translation: 提供用于防止微生物粘附的共聚物树脂，共聚物树脂的制备方法，含有共聚物树脂的涂料以及通过使用该涂料形成涂料的方法，以提高溶剂和耐化学性，以增强防污性 财产和减少收缩。 共聚物树脂包含由式1表示的重复单元和由式2表示的重复单元，其中R 1和R 3独立地为C 1 -C 5烷基; R2，R4，R5，R6，R7和R8独立地为H或C1-C20烷基。 共聚物树脂通过混合磷酸胆碱衍生物，（甲基）丙烯酸缩水甘油酯和引发剂来制备; 并在40-80℃下搅拌该混合物10-30小时进行自由基聚合。

    광염기 발생제를 함유한 포지티브형 감광성 폴리이미드조성물
    2.
    发明授权
    광염기 발생제를 함유한 포지티브형 감광성 폴리이미드조성물 失效
    含有PHOTOBASE发生器的正型型光敏聚酰亚胺组合物

    公开(公告)号：KR100822679B1

    公开(公告)日：2008-04-17

    申请号：KR1020060122003

    申请日：2006-12-05

    Applicant: 전남대학교산학협력단

    Inventor： 채규호 ,  장영민 ,  서지영

    IPC: G03F7/039

    Abstract: A positive type photosensitive polyimide composition containing a photobase generator is provided to obtain a positive type photosensitive polyimide capable of minimizing generation of contaminants and preventing a drop in resolution by using a reaction development patterning process. A positive type photosensitive polyimide composition comprises: a soluble polyimide represented by the following formula 1; polyamic acid represented by the following formula 2; and a photobase generator having an oxime-urethane group represented by the following formula 3. In the formulae, n is an integer of 3-10,000; p is 0 or 1; each of P and Q represents at least one substituent selected from the group consisting of phenyl, naphthyl, pentadienyl, halogen, C1-C4 alkyl-substituted phenyl, naphthyl and pentadienyl; and B is a leaving group including a C1-C20 aromatic or aliphatic hydrocarbon compound.

    Abstract translation: 提供含有光碱产生剂的正型光敏聚酰亚胺组合物，以获得通过使用反应显影图案化工艺能够最小化污染物产生并防止分辨率下降的正型光敏聚酰亚胺。 正型光敏聚酰亚胺组合物包含：由下式1表示的可溶性聚酰亚胺; 由下式2表示的聚酰胺酸; 和具有由下式3表示的肟 - 氨基甲酸酯基团的光碱产生剂。在式中，n为3-10,000的整数; p为0或1; P和Q中的每一个表示选自苯基，萘基，戊二烯基，卤素，C 1 -C 4烷基取代的苯基，萘基和戊二烯基中的至少一个取代基。 和B是包括C 1 -C 20芳族或脂族烃化合物的离去基团。

Patent Agency Ranking