Abstract:
본 발명은 액정표시장치의 기판 분리 및 재생 방법에 관한 것으로, 구체적으로는 액정표시장치에 포함되어 있는 기판을 재사용할 수 있도록 액정표시장치를 분해여 액정을 제거하고 컬러 필터 기판(상부 기판) 및 TFT-어레이 기판(하부 기판)상에 적층되어 있던 컬러 필터, 투명 전극, 편광 필름 등을 포함하는 여러 부품층 및 필름을 제거함으로써 상부 및 하부 기판을 분리 및 재생하는 방법에 관한 것이다. 상부 기판의 일면에는 편광 필름이 에폭시로 부착되고 다른 면에는 컬러 필터와 공통전극이 적층되어 구성되는 컬러 필터 기판(상부 기판)과, 게이트 전극과 실리콘 질화막과 액티브 층과 소스 및 드레인 전극과 화소 전극이 하부 기판의 일면에 적층되고 다른 면에는 편광필름이 에폭시로 부착되어 구성되는 TFT-어레이 기판(하부 기판)과, 상기 컬러 필터 기판(상부 기판)과 상기 TFT-어레이 기판(하부 기판) 사이에 채워져서 실란트에 의해 보존되는 액정으로 구성되는 액정표시장치에 있어서, 본 발명에 따르는 액정표시장치의 기판 분리 및 재생 방법은, 액정표시장치를 컬러 필터 기판 및 TFT-어레이 기판으로 각각 분리하는 단계; 분리된 상기 컬러 필터 기판(상부 기판)과 상기 TFT-어레이 기판(하부 기판)의 잔여 액정을 제거하는 단계; 상기 상부 기판 및 하부 기판의 일면에 부착된 편광 필름을 떼어내고 상부 기판 및 하부 기판상의 잔여 에폭시를 제거하는 단계; 상기 상부 기판의 다른 면에 구성된 컬러 필터 및 투명 전극층을 제거하는 단계; 및 상기 하부 기판의 일면에 배치된 실리콘 질화막을 용해하여, 액티브 층과 소스 및 드레인 전극과 화소 전극(투명 전극)을 제거하는 단계를 포함하는 것을 특징으로 한다.
Abstract:
PURPOSE: A heat radiation substrate and a method for manufacturing a thin film are provided to improve the deposition speed and density of the thin film by forming the thin film after filler powder and ceramic powder are changed into aerosols and are deposited on a substrate. CONSTITUTION: Material powder is generated by mixing ceramic powder with filler powder. The ceramic powder and the filler powder are changed into aerosols and a thin film (120) is formed by spraying the aerosols on a substrate (110). The substrate with the thin film is heated at temperatures between the melting point of the ceramic powder and the melting point of glass powder. A circuit pattern (130) made of copper or gold is formed on the upper side of the thin film. The filler powder includes epoxy or polyimide based polymer materials or the glass powder.
Abstract:
PURPOSE: A collecting method for indium tin oxide and valuable resources from a liquid crystal display device and collected indium tin oxide by the method are provided to collect indium tin oxide and valuable sources from a liquid crystal display device using a simple process. CONSTITUTION: A collecting method for indium tin oxide and valuable resources from a liquid crystal display device comprises the following steps: separating liquid crystal display(s110); separating an upper plate from a lower plate of a liquid crystal display(s120); removing polaroid film and liquid crystal residue of the upper plate(s130); removing a color filter of the upper plate and separating a glass substrate from the upper plate(s140); and heat treating and pulverizing the residual indium tin oxide(s150); and post-treating indium tin oxide(s160). In the first step, a sealed part of the upper and lower plates is cut by being scribed. The Polaroid film is removed by using an organic solvent. The color filter is removed by dissolving the color filter using alkaline solution. [Reference numerals] (AA) Start; (BB) End; (S110) Decomposing product and separating liquid crystal display; (S120) Separating an upper plate from a lower plate of a liquid crystal display; (S130) Removing Polaroid film and liquid crystal; (S140) Removing a color filter and separating a glass substrate; (S150) Heat treating and pulverizing the residual indium tin oxide; (S160) Post-treating indium tin oxide
Abstract:
PURPOSE: A method for separating and recycling a substrate of a liquid crystal display device is provided to eliminate several layers from a substrate without breaking the liquid crystal display device, thereby separating and recycling upper/lower substrates of the liquid crystal display device. CONSTITUTION: Polarization films attached to one-sides of upper/lower substrates are eliminated. Remaining epoxy is eliminated from the upper/lower substrates. A color filter and a transparent electrode layer are eliminated from the other side of the upper substrate. A silicon nitride film is dissolved while the silicon nitride film is arranged on the lower substrate. An active layer, source and drain electrodes, and a pixel electrode are eliminated. [Reference numerals] (AA) Disassembling products and separating TFT-LCDs; (BB) Cutting the edge and separating upper/lower substrates; (CC) Removing polarization films of the upper/lower substrates and epoxy; (DD) Removing a color filter and a transparent electrode of the upper substrate; (EE) Removing SiNx, a pixel electrode and residues of the lower substrate; (FF) Forming a recycled substrate; (GG) Treating the surface of the substrate for reinforcement
Abstract:
PURPOSE: A manufacturing apparatus of nanopowder through evaporation, condensation, and oil collection is provided to mass produce various kinds of active metal nano powders by including two source material evaporators and collecting nanopowder through oil which revolves in a vacuum condition. CONSTITUTION: A manufacturing apparatus of nanopowder through evaporation, condensation, and oil collection comprises a source material feeding unit(200) which successively provides source materials to a powder collecting unit, the powder collecting unit(100) which produces, collects, and discharges powder from the provided source materials, a vacuum pump which is connected to the source material feeding unit and the powder collecting unit and makes a vacuum state; a power supply unit which provides power to the source material feeding unit and the powder collecting unit, and a control unit(300) which is connected to the vacuum pump and the power supply unit and controls degree of a vacuum and power of the source material feeding unit and the powder collecting unit.
Abstract:
본 발명은 기판 상에 네가티브 포토레지스트층을 형성한 후, 포토레지스트층을 프리 베이킹하고 UV광을 조사하여 네가티브 포토레지스트층을 경화시킨 다음, 투명전도성산화물을 스퍼터링하여 네가티브 포토레지스트층 상에 증착하여 불규칙적인 미세 패턴을 가진 투명전극층을 형성하는 미세 패턴을 갖는 전극 구조물 및 이의 제작 방법에 관한 것이다.
Abstract:
PURPOSE: A silicon oxide nano-particle manufacturing method is provided to remove a high temperature process for removing harmful materials during a SiO2 nano powder formation by using Cl- or NO3- without the harmful materials for heating and washing processes. CONSTITUTION: A silicon oxide nano-particle manufacturing method comprises the following steps. A raw material in a Si content colloidal type is dissolved at a room temperature to manufacture an organic solution. The organic solution is stirred until the evaporation of the organic solution is completed, to manufacture a gelled compound. After the gelled compound is powderized, SiO2 is produced by a heating process. The heat processed SiO2 powder is uniformly dispersed. The mixing of the organic solution is performed at a room temperature. [Reference numerals] (AA) Clean solvent(aqueous, non-aqueous); (BB) Room temperature reaction; (CC) Low temperature oxidation